University of Alberta Self-Assembly of Block Copolymers for

Permission is hereby granted to the University of Alberta Libraries to reproduce single copies of this thesis and to lend or sell such copies for private, scholarly or scientific research purposes only. Where the thesis is converted to, or otherwise made available in digital form, the University of Alberta will advise potential users of the thesis of these terms. The author reserves all other publication and other rights in association with the copyright in the thesis and, except as herein before provided, neither the thesis nor any substantial portion thereof may be printed or otherwise reproduced in any material form whatsoever without the author’s prior written permission. The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the di-mensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new fabrication strate-gies must be introduced for these remarkable advances to continue. One tech-nology listed by the International Technology Roadmap for Semiconductors as a candidate for next-generation nanostructure fabrication is the directe