FOR EXPOSURE '1OOL CHARACTERIZATION

Photolithographers, especially those responsible for exposure tools, will learn that the following work is of significance in both informational and functional form. The design offered herein presents a unique combination of patterns which can be employed in the characterization, optimization and monitoring of exposure tools. The wide variety of both optical and electrical test struc tures as well as alignment targets available allow this design to be truely multipurpose. The procedures defined are complete and proven, providing the novice with adequate knowledge to examine an exposure tool's capabilities. The concept of this design evolved from an existing design which has proven itself worthy with many years of constant use. Necessary modifications and additions were made to improve the design's usefulness and understanding in its intended application. Full credit is given here to Dr. Edward T. Nelson for the design of the Process Development Mask Set, the original design on which the following work is based.-11