Multifunctional P-doped TiO2 thin films were synthesized by atmospheric pressure chemical vapor deposition (APCVD). This is the first example of P-doped TiO2 films with both P5+ and P3– states, with the relative proportion being determined by synthesis conditions. This technique to control the oxidation state of the impurities presents a new approach to achieve films with both self-cleaning and TCO properties. The origin of electrical conductivity in these materials was correlated to the incorporation of P5+ species, as suggested by Hall Effect probe measurements. The photocatalytic performance of the films was investigated using the model organic pollutant, stearic acid, with films containing predominately P3– states found to be vastly inf...
Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalyti...
Interest in titania based materials has grown in recent years owing to the potential application of ...
Atmospheric pressure chemical vapour deposition (APCVD) of N-doped titania thin films has been achie...
Thin films of interstitial boron-doped anatase TiO2, with varying B concentrations, were deposited v...
Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemic...
Transparent conducting oxide (TCO) thin films were synthesised by different chemical vapour depositi...
We present a detailed study on polycrystalline transparent conducting Ta-doped TiO2 films, obtained ...
The electronic properties of antimony-doped anatase (TiO2) thin films deposited via aerosol assisted...
Third-generation TiO2 photocatalysts were prepared by implantation of C+ ions into 110 nm thick TiO2...
The current work reports a potential technology for fabricating visible light activated doped TiO2 c...
Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical...
There is good reason to believe the performance of semiconductor metal oxides for catalytic applicat...
N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP...
The development of transparent conducting oxides (TCOs) has led to the evolution of a variety of opt...
Transparent, mechanically robust TiO2 films obtained by an innovative electrochemically assisted pro...
Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalyti...
Interest in titania based materials has grown in recent years owing to the potential application of ...
Atmospheric pressure chemical vapour deposition (APCVD) of N-doped titania thin films has been achie...
Thin films of interstitial boron-doped anatase TiO2, with varying B concentrations, were deposited v...
Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemic...
Transparent conducting oxide (TCO) thin films were synthesised by different chemical vapour depositi...
We present a detailed study on polycrystalline transparent conducting Ta-doped TiO2 films, obtained ...
The electronic properties of antimony-doped anatase (TiO2) thin films deposited via aerosol assisted...
Third-generation TiO2 photocatalysts were prepared by implantation of C+ ions into 110 nm thick TiO2...
The current work reports a potential technology for fabricating visible light activated doped TiO2 c...
Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical...
There is good reason to believe the performance of semiconductor metal oxides for catalytic applicat...
N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP...
The development of transparent conducting oxides (TCOs) has led to the evolution of a variety of opt...
Transparent, mechanically robust TiO2 films obtained by an innovative electrochemically assisted pro...
Tungsten doped titanium dioxide films with both transparent conducting oxide (TCO) and photocatalyti...
Interest in titania based materials has grown in recent years owing to the potential application of ...
Atmospheric pressure chemical vapour deposition (APCVD) of N-doped titania thin films has been achie...