We present results on CVD growth and electro-optical characterization of Ge0.92Sn0.08/Ge p-i-n heterostructure diodes. The suitability of Ge as barriers for direct bandgap GeSn active layers in different LED geometries, such as double heterostructures and multi quantum wells is discussed based on electroluminescence data. Theoretical calculations by effective mass and 6 band k∙p method reveal low barrier heights for this specific structure. Best configurations offer only a maximum barrier height for electrons of about 40 meV at the Γ point at room temperature (e.g. 300 K), evidently insufficient for proper light emitting devices. An alternative solution using SiGeSn as barrier material is introduced, which provides appropriate band alignmen...
The development of a light source on Si, which can be integrated in photonic circuits together with ...
GeSn on Si light-emitting diodes (LEDs) is investigated for different Sn concentrations up to 4.2% a...
The development of a light source on Si, which can be integrated in photonic circuits together with ...
We present results on CVD growth and electro-optical characterization of Ge0.92Sn0.08/Ge p-i-n heter...
Since the first report on lasing from GeSn/Ge/Si [1], optically-pumped lasing has been demonstrated ...
The experimental demonstration of fundamental direct bandgap, group IV GeSn alloys has constituted a...
Abstract Since the first demonstration of lasing in direct bandgap GeSn semiconductors, the research...
In this work, we discuss carrier confinement in double heterostructures and multiple quantum well Ge...
Growth and characterization of advanced group IV semiconductor materials with CMOS‐compatible applic...
Energy-efficient integrated circuits for on-chip or chip-to-chip data transfer via photons could be ...
Over the last decades, silicon-based integrated circuits underpinned information technology. To keep...
The ongoing growth of consumer electronics market, as well as the demand for even more complex data ...
SiGeSn ternaries are grown on Ge-buffered Si wafers incorporating Si or Sn contents of up to 15 at%....
The development of information technology during the last century was substantially pushed forward b...
The development of a light source on Si, which can be integrated in photonic circuits together with ...
GeSn on Si light-emitting diodes (LEDs) is investigated for different Sn concentrations up to 4.2% a...
The development of a light source on Si, which can be integrated in photonic circuits together with ...
We present results on CVD growth and electro-optical characterization of Ge0.92Sn0.08/Ge p-i-n heter...
Since the first report on lasing from GeSn/Ge/Si [1], optically-pumped lasing has been demonstrated ...
The experimental demonstration of fundamental direct bandgap, group IV GeSn alloys has constituted a...
Abstract Since the first demonstration of lasing in direct bandgap GeSn semiconductors, the research...
In this work, we discuss carrier confinement in double heterostructures and multiple quantum well Ge...
Growth and characterization of advanced group IV semiconductor materials with CMOS‐compatible applic...
Energy-efficient integrated circuits for on-chip or chip-to-chip data transfer via photons could be ...
Over the last decades, silicon-based integrated circuits underpinned information technology. To keep...
The ongoing growth of consumer electronics market, as well as the demand for even more complex data ...
SiGeSn ternaries are grown on Ge-buffered Si wafers incorporating Si or Sn contents of up to 15 at%....
The development of information technology during the last century was substantially pushed forward b...
The development of a light source on Si, which can be integrated in photonic circuits together with ...
GeSn on Si light-emitting diodes (LEDs) is investigated for different Sn concentrations up to 4.2% a...
The development of a light source on Si, which can be integrated in photonic circuits together with ...