Mechanical properties such as residual stress and magnetically induced strain such as magnetostriction in thin film can be measured using singly clamped cantilevers. By having a freshly deposited film on a cantilever, residual stress can be measured by simply determining curvature of the bending cantilever beam. Likewise, the coefficient of magnetostriction can also be determined by measuring curvature of a unimorph consisted of a magnetic layer and a non-magnetic cantilever under the application of magnetic field. Such sensitive experiment can offer quantitative evaluation of the material property being investigated. By applying the curvature measurement technique to combinatorial materials science, a high-precision, quantitative instrumen...
[[abstract]]A technique that provides a first approximation to the mean, sigma(0), and gradient, sig...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A new technique was developed for studying the mechanical behavior of thin films on substrate applic...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 19...
A new technique was developed for studying the mechanical behavior of nano-scale thin metal films on...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
Novel local curvature test structures combined with a sub-nanometer optical interferometry measureme...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
The authors describe their design for a paddle-like cantilever beam sample to relieve non-uniform st...
After forming electric devices, a magnetostriction effect sometimes deteriorates the sensitivity of ...
We present a versatile nanomechanical sensing platform for the investigation of magnetostriction in ...
After forming electric devices, a magnetostriction effect sometimes deteriorates the sensitivity of ...
Measurement of thin film magnetostriction is a challenging task, as magnetostrictive material deform...
[[abstract]]A technique that provides a first approximation to the mean, sigma(0), and gradient, sig...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A new technique was developed for studying the mechanical behavior of thin films on substrate applic...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 19...
A new technique was developed for studying the mechanical behavior of nano-scale thin metal films on...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
Novel local curvature test structures combined with a sub-nanometer optical interferometry measureme...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
A high-throughput high-sensitivity optical technique for measuringmagnetostriction of thin-film comp...
The authors describe their design for a paddle-like cantilever beam sample to relieve non-uniform st...
After forming electric devices, a magnetostriction effect sometimes deteriorates the sensitivity of ...
We present a versatile nanomechanical sensing platform for the investigation of magnetostriction in ...
After forming electric devices, a magnetostriction effect sometimes deteriorates the sensitivity of ...
Measurement of thin film magnetostriction is a challenging task, as magnetostrictive material deform...
[[abstract]]A technique that provides a first approximation to the mean, sigma(0), and gradient, sig...
We introduce a novel methodology for the in-situ measurement of mechanical stress during thin film g...
A new technique was developed for studying the mechanical behavior of thin films on substrate applic...