In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and presen...
X ray mirrors are needed for beam steering, beam alignment and monochromatisation at advanced resear...
Characterization of local order in thin films is challenging with pair distribution function (PDF) a...
A variation of the von Ardenne type of a duoplasmatron ion source is described. Here the arc dischar...
In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit...
We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and catho...
Sputter deposition is a versatile and industrially important deposition technique for thin films. Th...
Sputter deposition is a versatile and industrially important deposition technique for thin films. Th...
Paper presented at 11th International Conference on Synchrotron Radiation Instrumentation (SRI 2012)...
We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering andcathod...
We have developed a compact vacuum deposition chamber for in-situ x-ray scattering studies of organi...
International audienceA low/high temperature (60-1000K) and pressure (10(-10)-3x10(3) mbar) "baby ch...
The multipurpose portable ultra-high-vacuum-compatible chamber described in detail in this article h...
This article reports the design, construction, and first use of an experimental device consisting of...
This article reports the design, construction, and first use of an experimental device consisting of...
We report the design of a mobile setup for synchrotron based in situ studies during atomic layer pro...
X ray mirrors are needed for beam steering, beam alignment and monochromatisation at advanced resear...
Characterization of local order in thin films is challenging with pair distribution function (PDF) a...
A variation of the von Ardenne type of a duoplasmatron ion source is described. Here the arc dischar...
In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit...
We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and catho...
Sputter deposition is a versatile and industrially important deposition technique for thin films. Th...
Sputter deposition is a versatile and industrially important deposition technique for thin films. Th...
Paper presented at 11th International Conference on Synchrotron Radiation Instrumentation (SRI 2012)...
We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering andcathod...
We have developed a compact vacuum deposition chamber for in-situ x-ray scattering studies of organi...
International audienceA low/high temperature (60-1000K) and pressure (10(-10)-3x10(3) mbar) "baby ch...
The multipurpose portable ultra-high-vacuum-compatible chamber described in detail in this article h...
This article reports the design, construction, and first use of an experimental device consisting of...
This article reports the design, construction, and first use of an experimental device consisting of...
We report the design of a mobile setup for synchrotron based in situ studies during atomic layer pro...
X ray mirrors are needed for beam steering, beam alignment and monochromatisation at advanced resear...
Characterization of local order in thin films is challenging with pair distribution function (PDF) a...
A variation of the von Ardenne type of a duoplasmatron ion source is described. Here the arc dischar...