Titanium oxide thin film deposition by pulsed arc vacuum plasma

The experimental study of effects of deposition conditions and plasma parameters on the structure of titanium oxide films is presented. The films are deposited by reactive deposition from a plasma generated by a pulsed cathodic vacuum arc source. The effects of deposition time and substrate bias voltage are studied, the films being deposited at different substrate temperatures. Bragg-Brentano X-ray diffraction and electron microscopy were used to investigate the structure of deposited films. Correlation between plasma parameters, deposition conditions and structure of synthesized films are established.SCOPUS: cp.j