Frontend and backend wearout mechanisms are major reliability concerns for modern microprocessors. In this research, a framework which contains modules for negative bias temperature instability (NBTI), positive bias temperature instability (PBTI), hot carrier injection (HCI), gate-oxide breakdown (GOBD), backend time-dependent dielectric breakdown (BTDDB), electromigration (EM), and stress-induced voiding (SIV) is proposed to analyze the impact of each wearout mechanism on state-of-art microprocessors and to accurately estimate microprocessor lifetimes due to each wearout mechanism. Taking into account the detailed thermal profiles, electrical stress profiles and a variety of use scenarios, composed of a fraction of time in operation, a fra...
Rapid advances in VLSI technology have led to scaling of Modern CMOS Technologies. With feature size...
Modern CMOS technologies are continuously scaling down. As a result of this, analog designers have s...
This book provides readers with a detailed reference regarding two of the most important long-term r...
UnrestrictedDeep submicron semiconductor technologies enable greater degrees of device integration a...
Reliability is a fundamental challenge for current and future microprocessors with advanced nanoscal...
Abstract-Degradation of device parameters over the lifetime of a system is emerging as a significant...
CMOS VLSI circuit reliability modeling and simulation have attracted intense research interest in th...
As MOSFET technology is being aggressively scaled, the number of active devices per micro-processor ...
Product development based on highly integrated semiconductor circuits faces various challenges. To e...
CMOS technology dominates the semiconductor industry, and the reliability of MOSFETs is a key issue....
Abstract: Negative Bias Temperature Instability (NBTI) is identified as one of the most critical rel...
Technology scaling along with the process developments has resulted in performance improvement of th...
As we enter into sub-nanometer technologies in order to increase performance of CMOS devices, reliab...
Reliability failure mechanisms, such as time dependent dielectric e breakdown, electromigration, and...
[[abstract]]With an increase of power dissipation and integrated-circuit (IC) density in system-on-a...
Rapid advances in VLSI technology have led to scaling of Modern CMOS Technologies. With feature size...
Modern CMOS technologies are continuously scaling down. As a result of this, analog designers have s...
This book provides readers with a detailed reference regarding two of the most important long-term r...
UnrestrictedDeep submicron semiconductor technologies enable greater degrees of device integration a...
Reliability is a fundamental challenge for current and future microprocessors with advanced nanoscal...
Abstract-Degradation of device parameters over the lifetime of a system is emerging as a significant...
CMOS VLSI circuit reliability modeling and simulation have attracted intense research interest in th...
As MOSFET technology is being aggressively scaled, the number of active devices per micro-processor ...
Product development based on highly integrated semiconductor circuits faces various challenges. To e...
CMOS technology dominates the semiconductor industry, and the reliability of MOSFETs is a key issue....
Abstract: Negative Bias Temperature Instability (NBTI) is identified as one of the most critical rel...
Technology scaling along with the process developments has resulted in performance improvement of th...
As we enter into sub-nanometer technologies in order to increase performance of CMOS devices, reliab...
Reliability failure mechanisms, such as time dependent dielectric e breakdown, electromigration, and...
[[abstract]]With an increase of power dissipation and integrated-circuit (IC) density in system-on-a...
Rapid advances in VLSI technology have led to scaling of Modern CMOS Technologies. With feature size...
Modern CMOS technologies are continuously scaling down. As a result of this, analog designers have s...
This book provides readers with a detailed reference regarding two of the most important long-term r...