Reactively sputtered piezoelectric aluminum nitride (AlN) films for flexural plate wave (FPW) electroacoustic sensors equipped with buried interdigital transducers (IDTs) for sensing in liquids were fabricated and characterized. In order to assess the crystallographic and elastic film properties, residual film stress, and piezoelectric response, comprehensive analyses were performed on AlN layers and bimorph AlN structures, including X-ray diffraction, atomic force microscopy, and nanoindentation, in combination with analysis of the piezoelectric charge coefficient d(33,f). To demonstrate the applicability of the optimized AlN films to electro-acoustic devices, IDT equipped devices were fabricated and characterized by means of laser Doppler...
Nanoindentation measurements along with atomic force microscopy, X-ray diffraction, and residual str...
Recently, the enormous growth in personal communications systems (PCS), satellite communication and ...
International audienceAluminum nitride AlN thin films were deposited at room temperature by pulsed l...
Aluminum Nitride (AlN) is explored as a thin film material for piezoelectric MEMS applications. A pu...
Aluminum Nitride (AlN) is explored as a thin film material for piezoelectric MEMS applications. A pu...
Due to their outstanding properties flexural plate wave (FPW) devices based on piezoelectric aluminu...
Novel flexural plate wave resonators based on bilayer AlN membranes were fabricated and investigated...
During the last decades, sensors technology has been increasingly developed. The widespread use of s...
Aluminum nitride is a promising material for the use as a piezoelectric sensor material for resonanc...
The requirements of the consumer market on high frequency devices have been more and more demanding ...
This dissertation presents the fabrication and characterization of the AlN thin film bulk acoustic w...
Aluminum nitride (AlN) thin films deposited by reactive radio frequency magnetron sputtering in an A...
A comprehensive study on the complete process for the fabrication of AlN-based MEMS sensors and actu...
Surface acoustic wave device with c-axis-oriented aluminum nitride (AlN) piezoelectric thin films on...
[[abstract]]Y-128� LiNbO3 is used extensively for the development of surface acoustic wave (SAW) dev...
Nanoindentation measurements along with atomic force microscopy, X-ray diffraction, and residual str...
Recently, the enormous growth in personal communications systems (PCS), satellite communication and ...
International audienceAluminum nitride AlN thin films were deposited at room temperature by pulsed l...
Aluminum Nitride (AlN) is explored as a thin film material for piezoelectric MEMS applications. A pu...
Aluminum Nitride (AlN) is explored as a thin film material for piezoelectric MEMS applications. A pu...
Due to their outstanding properties flexural plate wave (FPW) devices based on piezoelectric aluminu...
Novel flexural plate wave resonators based on bilayer AlN membranes were fabricated and investigated...
During the last decades, sensors technology has been increasingly developed. The widespread use of s...
Aluminum nitride is a promising material for the use as a piezoelectric sensor material for resonanc...
The requirements of the consumer market on high frequency devices have been more and more demanding ...
This dissertation presents the fabrication and characterization of the AlN thin film bulk acoustic w...
Aluminum nitride (AlN) thin films deposited by reactive radio frequency magnetron sputtering in an A...
A comprehensive study on the complete process for the fabrication of AlN-based MEMS sensors and actu...
Surface acoustic wave device with c-axis-oriented aluminum nitride (AlN) piezoelectric thin films on...
[[abstract]]Y-128� LiNbO3 is used extensively for the development of surface acoustic wave (SAW) dev...
Nanoindentation measurements along with atomic force microscopy, X-ray diffraction, and residual str...
Recently, the enormous growth in personal communications systems (PCS), satellite communication and ...
International audienceAluminum nitride AlN thin films were deposited at room temperature by pulsed l...