Continued research in electronic engineering technology has led to a miniaturisation of integrated circuits. Further reduction in the dimensions of the interconnects is impeded by the presence of small cracks or voids. Subject to high current and elastic stress, voids tend to drift and change shape in the interconnect, leading to a potential mechanical failure of the system. This thesis investigates the temporal evolution of voids moving along conductors, in the presence of surface diffusion, electric loading and elastic stress. We simulate a bulk-interface coupled system, with a moving interface governed by a fourth-order geometric evolution equation and a bulk where the electric potential and the displacement field are computed. We...
Grain-boundary migration, void formation as well as associated hillock formation are important mecha...
Abstract We consider a finite element approximation of a phase field model for the evolu-tion of voi...
Moving boundary value problems are the crossroads of CAD and Analysis. In these class of problems, b...
This thesis addresses electromigration-induced void dynamics in metallic thin films. This has been a...
Understanding the effect of high current density on void formation and growth and relating the size ...
With reduction in size, ever greater operational demands are placed on electronics components at all...
We study the motion of voids in conductors subject to intense electrical current densities. We use a...
The void electromigration process in the strip geometry is investigated analytically and numerically...
Failures introduced by the electromigration (EM) effect in copper interconnect is one of the top rel...
Surface electromigration refers to the directed motion of atoms at solid surfaces and interfaces whi...
Abstract. The stress-driven grain boundary diffusion problem is a continuum model of mass transport ...
Modeling and simulation of the temporal evolution of electromigration voids are critical to evaluate...
The morphological evolution of intragranular voids induced by surface drift diffusion under the acti...
A comprehensive picture of void dynamics in connection with the critical morphological evolution has...
A well-posed moving boundary-value problem, describing the dynamics of curved interfaces and surface...
Grain-boundary migration, void formation as well as associated hillock formation are important mecha...
Abstract We consider a finite element approximation of a phase field model for the evolu-tion of voi...
Moving boundary value problems are the crossroads of CAD and Analysis. In these class of problems, b...
This thesis addresses electromigration-induced void dynamics in metallic thin films. This has been a...
Understanding the effect of high current density on void formation and growth and relating the size ...
With reduction in size, ever greater operational demands are placed on electronics components at all...
We study the motion of voids in conductors subject to intense electrical current densities. We use a...
The void electromigration process in the strip geometry is investigated analytically and numerically...
Failures introduced by the electromigration (EM) effect in copper interconnect is one of the top rel...
Surface electromigration refers to the directed motion of atoms at solid surfaces and interfaces whi...
Abstract. The stress-driven grain boundary diffusion problem is a continuum model of mass transport ...
Modeling and simulation of the temporal evolution of electromigration voids are critical to evaluate...
The morphological evolution of intragranular voids induced by surface drift diffusion under the acti...
A comprehensive picture of void dynamics in connection with the critical morphological evolution has...
A well-posed moving boundary-value problem, describing the dynamics of curved interfaces and surface...
Grain-boundary migration, void formation as well as associated hillock formation are important mecha...
Abstract We consider a finite element approximation of a phase field model for the evolu-tion of voi...
Moving boundary value problems are the crossroads of CAD and Analysis. In these class of problems, b...