Driven by increasingly aggressive CMOS technology scaling, sub-wavelength lithography is incurring more evident variability in the technology parameters of the semiconductors fabrication process. That variability results in otherwise identical designs displaying very different performances, power consumption levels and lifespans once fabricated. Hence, process variability may lead to execution uncertainties, impacting the expected quality of service and energy efficiency of the running software. As such uncertainties are intolerable in certain application domains such as automotive and avionic infotainment systems, it has become a persistent necessity to customize runtime engines to introduce measures for variability awareness in task alloc...
none6siMultimedia streaming applications running on next-generation parallel multiprocessor arrays i...
none5noAbstract Sub-50nm CMOS technologies are affected by significant variability which causes pow...
Current multi-core design methodologies are facing increasing unpredictability in terms of quality d...
Driven by increasingly aggressive CMOS technology scaling, sub-wavelength lithography is incurring m...
Workload allocation in embedded multicore platforms is an increasing challenging issue due to hetero...
With scaling of semiconductor fabrication technologies and the push towards deep sub-micron technolo...
The impact of process variations and wear-out mechanisms in current and next generation technology n...
Manufacturing process variation is dramatically becoming one of the most important challenges relate...
Variation in performance and power across manufactured parts and their operating conditions is an ac...
none6The impact of variability on sub-45nm CMOS multimedia platforms makes hard to provide applicati...
As integrated-circuit technology continues to scale, process variation is becoming an issue that can...
Manufacturing and environmental variations cause timing errors that are typically avoided by conserv...
Faced with the challenge of finding ways to use an ever-growing transistor budget, microarchitects h...
none6siMultimedia streaming applications running on next-generation parallel multiprocessor arrays i...
none5noAbstract Sub-50nm CMOS technologies are affected by significant variability which causes pow...
Current multi-core design methodologies are facing increasing unpredictability in terms of quality d...
Driven by increasingly aggressive CMOS technology scaling, sub-wavelength lithography is incurring m...
Workload allocation in embedded multicore platforms is an increasing challenging issue due to hetero...
With scaling of semiconductor fabrication technologies and the push towards deep sub-micron technolo...
The impact of process variations and wear-out mechanisms in current and next generation technology n...
Manufacturing process variation is dramatically becoming one of the most important challenges relate...
Variation in performance and power across manufactured parts and their operating conditions is an ac...
none6The impact of variability on sub-45nm CMOS multimedia platforms makes hard to provide applicati...
As integrated-circuit technology continues to scale, process variation is becoming an issue that can...
Manufacturing and environmental variations cause timing errors that are typically avoided by conserv...
Faced with the challenge of finding ways to use an ever-growing transistor budget, microarchitects h...
none6siMultimedia streaming applications running on next-generation parallel multiprocessor arrays i...
none5noAbstract Sub-50nm CMOS technologies are affected by significant variability which causes pow...
Current multi-core design methodologies are facing increasing unpredictability in terms of quality d...