Add to ORKGThis report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and titanium dioxide (TiO2) films deposited in the Cambridge Nanotech Savannah system. A brief study of the presence of pinholes in these films is also presented
Atomic Layer Deposition (ALD) is a thin film deposition technique that has received a lot of attenti...
The essential features of the ALD process involve sequentially saturating a surface with a (sub)mono...
In this study we compare the thicknesses and optical properties of atomic layer deposited (ALD) Al2O...
This report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and t...
Atomic layer deposition (ALD) is potentially a very suitable deposition technology to grow ultra thi...
Atomic Layer Deposition (ALD) enables the fabrication of highly uniform and conformal thin films, an...
Atomic layer deposition (ALD) is a thin film synthesis technique that can provide exquisite accuracy...
We have been developing our capability with atomic layer deposition (ALD), to understand the influen...
Technological products in the fields of optoelectronic, energy conversion, nano-medical applications...
In this review, the discussion emphasized on the growth mechanisms of atomic layer deposition which ...
Over the course of this semester understanding of the theory and application of Atomic Layer Deposit...
Ceramic oxide thin films are an important material, with applications in many areas of science and t...
TiO2 is a widely studied material due to its optical and photocatalytic properties and its hydrophil...
Titanium-based alloys are one of the most important materials used for manufacture of biomedical imp...
Atomic layer deposition was used to grow Al2O3, TiO2 and ZrO2 thin films. The mechanism of film grow...
Atomic Layer Deposition (ALD) is a thin film deposition technique that has received a lot of attenti...
The essential features of the ALD process involve sequentially saturating a surface with a (sub)mono...
In this study we compare the thicknesses and optical properties of atomic layer deposited (ALD) Al2O...
This report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and t...
Atomic layer deposition (ALD) is potentially a very suitable deposition technology to grow ultra thi...
Atomic Layer Deposition (ALD) enables the fabrication of highly uniform and conformal thin films, an...
Atomic layer deposition (ALD) is a thin film synthesis technique that can provide exquisite accuracy...
We have been developing our capability with atomic layer deposition (ALD), to understand the influen...
Technological products in the fields of optoelectronic, energy conversion, nano-medical applications...
In this review, the discussion emphasized on the growth mechanisms of atomic layer deposition which ...
Over the course of this semester understanding of the theory and application of Atomic Layer Deposit...
Ceramic oxide thin films are an important material, with applications in many areas of science and t...
TiO2 is a widely studied material due to its optical and photocatalytic properties and its hydrophil...
Titanium-based alloys are one of the most important materials used for manufacture of biomedical imp...
Atomic layer deposition was used to grow Al2O3, TiO2 and ZrO2 thin films. The mechanism of film grow...
Atomic Layer Deposition (ALD) is a thin film deposition technique that has received a lot of attenti...
The essential features of the ALD process involve sequentially saturating a surface with a (sub)mono...
In this study we compare the thicknesses and optical properties of atomic layer deposited (ALD) Al2O...