Add to ORKGA novel fabrication process was developed to realize high quality SiOx masks for Cl2 based ICP etching of InP. First order DBR mirrors, 3 µm deep, were realized that can be used in photonic integrated circuits. The process can be used in combination with conventional optical lithography, reducing production cost
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
A double layer mask strategy involving ebeam lithography, pattern transfer to a SixNy-mask layer wit...
Deeply etched DBR mirrors are a new building block for complex Photonic Integrated Circuits. They gr...
A novel fabrication process was developed to realize high quality SiOx masks for Cl2 based ICP etchi...
We present the progress on deep etching of InP for the fabrication of DBR gratings in Photonic Integ...
We present the progress on deep etching of InP for the fabrication of DBR gratings in Photonic Integ...
A three-level masking process has been developed for etching DBR gratings in InP/InGaAsP double hete...
Deeply-etched Distributed Bragg Reflector (DBR) mirrors are a new versatile building block for Photo...
Deeply-etched DBR gratings are versatile components for application in Photonic Integrated Circuits....
Smooth and vertical sidewalls ridge waveguides are essential for applications in photonic circuits. ...
Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...
Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
A double layer mask strategy involving ebeam lithography, pattern transfer to a SixNy-mask layer wit...
Deeply etched DBR mirrors are a new building block for complex Photonic Integrated Circuits. They gr...
A novel fabrication process was developed to realize high quality SiOx masks for Cl2 based ICP etchi...
We present the progress on deep etching of InP for the fabrication of DBR gratings in Photonic Integ...
We present the progress on deep etching of InP for the fabrication of DBR gratings in Photonic Integ...
A three-level masking process has been developed for etching DBR gratings in InP/InGaAsP double hete...
Deeply-etched Distributed Bragg Reflector (DBR) mirrors are a new versatile building block for Photo...
Deeply-etched DBR gratings are versatile components for application in Photonic Integrated Circuits....
Smooth and vertical sidewalls ridge waveguides are essential for applications in photonic circuits. ...
Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...
Chlorine-based inductively coupled plasma etching processes are investigated for the purpose of etch...
Ridge waveguides with smooth and vertical sidewalls are essential in photonic circuits. We have inve...
A double layer mask strategy involving ebeam lithography, pattern transfer to a SixNy-mask layer wit...
Deeply etched DBR mirrors are a new building block for complex Photonic Integrated Circuits. They gr...