Low pressure RF plasmas are widely used in the microelectronics industry for the production of integrated circuits. External conditions, like pressure, power, geometry and driving frequency determine the properties of the plasma and thus its practical use in various applications. The influence of the applied RF frequency has been studied by several authors. When the driving frequency is in the order, or lower than the ion transit frequency across the sheath (~1 MHz), the discharge is then sustained by ionization due to the secondary electrons from the electrodes. We applied a 450 kHz RF voltage to a capacitively coupled parallel plate plasma reactor filled with 158 mTorr argon. Time resolved emission spectroscopy is used to study the excita...
International audienceUsing a range of different diagnostics we have performed a detailed experiment...
Ion dynamics are investigated in a single and dual radio frequency sheath as a function of radius ab...
For a single-frequency capacitively coupled radio-frequency discharge, the detailed examination has ...
Low pressure RF plasmas are widely used in the microelectronics industry for the production of integ...
In this study, the characteristic properties and plasma parameters of capacitive radio frequency (RF...
The plasma properties of a capacitively coupled atmospheric pressure plasma in Argon as a function o...
Abstract-In low-pressure capacitively coupled parallel-plate radio-frequency (RF) discharges, such a...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
The electron dynamics in the low-pressure operation regime (< 5 Pa) of a neon capacitively coupled p...
The need for rapid and large area wafer processing in the semiconductor industry has increased the i...
Abstract-The generation of electron beams by the expanding sheath is observed experimentally in asym...
Abstract—The electron dynamics in the low-pressure opera-tion regime (< 5 Pa) of a neon capacitiv...
The electron dynamics in the low-pressure operation regime ($«$ 5 Pa) of a neon capacitively coupled...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
International audienceThis paper uses experiments and modelling to study capacitively coupled radio-...
International audienceUsing a range of different diagnostics we have performed a detailed experiment...
Ion dynamics are investigated in a single and dual radio frequency sheath as a function of radius ab...
For a single-frequency capacitively coupled radio-frequency discharge, the detailed examination has ...
Low pressure RF plasmas are widely used in the microelectronics industry for the production of integ...
In this study, the characteristic properties and plasma parameters of capacitive radio frequency (RF...
The plasma properties of a capacitively coupled atmospheric pressure plasma in Argon as a function o...
Abstract-In low-pressure capacitively coupled parallel-plate radio-frequency (RF) discharges, such a...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
The electron dynamics in the low-pressure operation regime (< 5 Pa) of a neon capacitively coupled p...
The need for rapid and large area wafer processing in the semiconductor industry has increased the i...
Abstract-The generation of electron beams by the expanding sheath is observed experimentally in asym...
Abstract—The electron dynamics in the low-pressure opera-tion regime (< 5 Pa) of a neon capacitiv...
The electron dynamics in the low-pressure operation regime ($«$ 5 Pa) of a neon capacitively coupled...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
International audienceThis paper uses experiments and modelling to study capacitively coupled radio-...
International audienceUsing a range of different diagnostics we have performed a detailed experiment...
Ion dynamics are investigated in a single and dual radio frequency sheath as a function of radius ab...
For a single-frequency capacitively coupled radio-frequency discharge, the detailed examination has ...