Density-functional calculations are performed to explore the relationship between the work function and Young's modulus of RhSi, and to estimate the p-Schottky-barrier height (SBH) at the Si/RhSi(010) interface. It is shown that the Young's modulus and the workfunction of RhSi satisfy the generic sextic relation, proposed recently for elemental metals. The calculated p-SBH at the Si/RhSi interface is found to differ only by 0.04 eV in opposite limits, viz., no-pinning and strong pinning. We find that the p-SBH is reduced as much as by 0.28 eV due to vacancies at the interface
Fermi level pinning at Schottky barriers strongly limits the minimization of contact resistances in ...
The dependence of barrier height on the metal work function of metal-SiO2-p-Si Schottky barrier diod...
The dependence of barrier height on the metal work function of metal-SiO2-p-Si Schottky barrier diod...
Density-functional calculations are performed to explore the relationship between the work function ...
Density-functional calculations are performed to explore the relationship between the work function ...
Abstract Density functional supercell calculations of the Schottky barrier heights (SBH) of metal ge...
Density functional supercell calculations of the Schottky barrier heights (SBH) of metal germanides ...
Density functional supercell calculations of the Schottky barrier heights (SBH) of metal germanides ...
Nickel monosilicide (NiSi) and Platinum monosilicide (PtSi) are highly promising for applications as...
Nickel monosilicide (NiSi) and Platinum monosilicide (PtSi) are highly promising for applications as...
Schottky barriers at metal-semiconductor interfaces have attracted much interest in recent years. On...
Schottky barriers at metal-semiconductor interfaces have attracted much interest in recent years. On...
Schottky barriers at metal-semiconductor interfaces have attracted much interest in recent years. On...
The profile of the energy bands of a semiconductor in contact with a metal is determined by the inte...
Fermi level pinning at Schottky barriers strongly limits the minimization of contact resistances in ...
Fermi level pinning at Schottky barriers strongly limits the minimization of contact resistances in ...
The dependence of barrier height on the metal work function of metal-SiO2-p-Si Schottky barrier diod...
The dependence of barrier height on the metal work function of metal-SiO2-p-Si Schottky barrier diod...
Density-functional calculations are performed to explore the relationship between the work function ...
Density-functional calculations are performed to explore the relationship between the work function ...
Abstract Density functional supercell calculations of the Schottky barrier heights (SBH) of metal ge...
Density functional supercell calculations of the Schottky barrier heights (SBH) of metal germanides ...
Density functional supercell calculations of the Schottky barrier heights (SBH) of metal germanides ...
Nickel monosilicide (NiSi) and Platinum monosilicide (PtSi) are highly promising for applications as...
Nickel monosilicide (NiSi) and Platinum monosilicide (PtSi) are highly promising for applications as...
Schottky barriers at metal-semiconductor interfaces have attracted much interest in recent years. On...
Schottky barriers at metal-semiconductor interfaces have attracted much interest in recent years. On...
Schottky barriers at metal-semiconductor interfaces have attracted much interest in recent years. On...
The profile of the energy bands of a semiconductor in contact with a metal is determined by the inte...
Fermi level pinning at Schottky barriers strongly limits the minimization of contact resistances in ...
Fermi level pinning at Schottky barriers strongly limits the minimization of contact resistances in ...
The dependence of barrier height on the metal work function of metal-SiO2-p-Si Schottky barrier diod...
The dependence of barrier height on the metal work function of metal-SiO2-p-Si Schottky barrier diod...