In the previous papers, we showed that the CdSe evaporation temperature range of 700-850oC was profitable to obtain high Gm TFT independent of the substrate temperature. Here, the deposition temperature dependence of Hall mobility of CdSe thin films is investigated, and it is shown that dependence of Gm of TFT on the deposition conditions is attributed to the Hall mobility dependence of CdSe films on the deposition conditions. The variations of the conductivity, Hall mobility and carrier concentration of CdSe films as a function of temperature are also investigated. These results show that the conduction electrons of most CdSe films are degenerated at the room temperature, and that Hall mobility increases with temperature approximately foll...
In this paper, deposition of CdS thin films by thermal evaporation was made using high purity CdS po...
Cadmium sulfide (CdS) thin films were prepared under vacuum onto glass slides by closed space sublim...
Low-temperature vacuum deposition instead of the commonly used vacuum deposition at high substrate t...
CdS film has been generally used for the semiconductor layer of the TFT since P.K. Weimer\u27s inven...
Fabrication conditions such as CdSe deposition temperature and electrode material which are necessar...
CdS films were prepared by thermal evaporation technique at thickness 1 µm on glass substrates and t...
Most group II VI compounds are direct band gap semiconductors with high optical absorption and emiss...
Abstract. The current (I)–voltage (V) characteristics of thermally evaporated CdSe thin films having...
In this work, some structural, electrical and optical properties of thermally evaporated CdS thin fi...
In this work, some structural, electrical and optical properties of thermally evaporated CdS thin fi...
Polycrystalline cadmium selenide thin films are prepared in different thicknesses and substrate temp...
ABSTRACT Thin films of CdS of different thickness have been prepared on glass substrates in various ...
CdSe thin films were deposited by thermal evaporation and e-beam evaporation techniques on to well c...
The aim of this research is to prepare ( CdSe0.5Te0.5) thin films by vacuum thermal evaporation meth...
Electrical instability of operation of the thin film transistor is the major problem preventing the ...
In this paper, deposition of CdS thin films by thermal evaporation was made using high purity CdS po...
Cadmium sulfide (CdS) thin films were prepared under vacuum onto glass slides by closed space sublim...
Low-temperature vacuum deposition instead of the commonly used vacuum deposition at high substrate t...
CdS film has been generally used for the semiconductor layer of the TFT since P.K. Weimer\u27s inven...
Fabrication conditions such as CdSe deposition temperature and electrode material which are necessar...
CdS films were prepared by thermal evaporation technique at thickness 1 µm on glass substrates and t...
Most group II VI compounds are direct band gap semiconductors with high optical absorption and emiss...
Abstract. The current (I)–voltage (V) characteristics of thermally evaporated CdSe thin films having...
In this work, some structural, electrical and optical properties of thermally evaporated CdS thin fi...
In this work, some structural, electrical and optical properties of thermally evaporated CdS thin fi...
Polycrystalline cadmium selenide thin films are prepared in different thicknesses and substrate temp...
ABSTRACT Thin films of CdS of different thickness have been prepared on glass substrates in various ...
CdSe thin films were deposited by thermal evaporation and e-beam evaporation techniques on to well c...
The aim of this research is to prepare ( CdSe0.5Te0.5) thin films by vacuum thermal evaporation meth...
Electrical instability of operation of the thin film transistor is the major problem preventing the ...
In this paper, deposition of CdS thin films by thermal evaporation was made using high purity CdS po...
Cadmium sulfide (CdS) thin films were prepared under vacuum onto glass slides by closed space sublim...
Low-temperature vacuum deposition instead of the commonly used vacuum deposition at high substrate t...