The TiO(2) nanorod arrays, with about 1.8 mu m lengths, have been deposited on ITO substrates by dc reactive magnetron sputtering at different target-substrate distances. The average diameter of these nanorods can be modified from about 45 to 85 nm by adjusting the target-substrate distance from 90 to 50 mm. These nanorods are highly ordered and perpendicular to the substrate. Both XRD and Raman measurements show that the nanorods prepared at different target-substrate distances have only an anatase TiO(2) phase. The nanorods prepared at the target-substrate distance less than 80 mm have a preferred orientation along the (2 2 0) direction. However, this preferred orientation disappears as the target-substrate distance is more than 80 mm. Th...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It h...
The TiO2 nanorod arrays, with about 1.8 μm lengths, have been deposited on ITO substrates by dc reac...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
For the first time, the TiO2 nanorod arrays have been prepared on ITO substrates at room temperature...
TiO2 nanorodswere prepared by DC reactivemagnetron sputtering technique and applied to dye-sensitize...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
Abstract: Anatase TiO(2) nanorod films have been prepared on ITO coated glass substrates at room tem...
The anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature...
Three different thickness dense TiO2 (150 nm, 300 nm and 450 nm respectively) films were deposited o...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
Anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature by ...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It h...
The TiO2 nanorod arrays, with about 1.8 μm lengths, have been deposited on ITO substrates by dc reac...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
For the first time, the TiO2 nanorod arrays have been prepared on ITO substrates at room temperature...
TiO2 nanorodswere prepared by DC reactivemagnetron sputtering technique and applied to dye-sensitize...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
Abstract: Anatase TiO(2) nanorod films have been prepared on ITO coated glass substrates at room tem...
The anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature...
Three different thickness dense TiO2 (150 nm, 300 nm and 450 nm respectively) films were deposited o...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
Anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature by ...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It h...