Thin film techniques for solid state ionic devices

The perovskite of type LaCrO{sub 3} sense electrode for a new type growth and patterning of thin tas been previously shown to be an excellent of mixed potential sensor. Techniques for the film electrodes with stable morphology and reproducible stoichiometry grown on yttria-stabilized zirconia solid electrolyte have therefore become extremely desirable. In this work, thin films of LaCrO{sub 3} and La{sub 0.8}Sr{sub 0.2}Cr0{sub 3} were prepared using RF magnetron sputtering, electron beam evaporation and pulsed laser deposition. Direct growth of the perovskite from oxide targets were usually accompanied by second phases with Cr in valance states higher than 3'. Films prepared by an intermediate fluoride process via offaxis RF magnetron sputtering process produced the highest quality films but the deposition rate was typically low at approximately 1500khr. Stoichiometric films were prepared using an electron beamlthermal evaporation dual source method but not reproducibly. Single-phase lanthanum chromite films could not be prepared using PLD and a fluoride precursor