The processing-structure-property relationship is investigated for electrodeposited foils of the gold-copper alloy system. A model is presented that relates the deposition process parameters to the nanocrystalline grain size. An activation energy of 1.52 eV {center_dot} atom{sup -1} for growth is determined for a long pulse (>10 msec) mode, and is 0.16 eV {center_dot} atom{sup -1} for short pulses (<5 msec). The affect of nanocrystalline grain size on the mechanical properties is assessed using indentation measurements. A Hall-Petch type variation of the Vickers microhardness with nanocrystalline grain size (>6 nm) is observed for Au-Cu samples with 1-12 wt.% Cu as tested in cross-section. The hardness increases three-fold from a r...
Cu-Ag alloys are promising materials for electrical interconnections due to their combination of hig...
The effect of Cu dissolution during pulse electrodeposition process on the generation of high densit...
Cu interconnects are essential in advanced integrated circuits to minimize the RC delay. In manufact...
Grain refinement to the nanocrystalline scale is known to enhance physical properties as strength an...
The process parameters of current density, pulse duration, and cell potential affect both the struct...
In the present work, the gold-nanoplating technique is used to monitor differences in the electroche...
The relationships between grain morphology, preferred orientation, and mechanical performance of com...
Strengthening of electrodeposited gold-based materials is achieved by alloying with copper according...
In this paper, the microstructure and hardness evolutions of commercially pure Cu subjected to high ...
The objective of this work is to investigate the microstrain effect on grain growth and strain relea...
Nanocrystalline materials have generated immense scientific interest, primarily due to observations ...
This article presents a method for the sample preparation and characterisation of bulk copper having...
An ultrafine grained Cu with a wide distribution of grain size and an average grain size of d= 110 n...
This research work presents the first comprehensive study on nanocrystalline materials produced in b...
The mechanical properties of mechanically milled copper and copper-30 iron were studied in the as-mi...
Cu-Ag alloys are promising materials for electrical interconnections due to their combination of hig...
The effect of Cu dissolution during pulse electrodeposition process on the generation of high densit...
Cu interconnects are essential in advanced integrated circuits to minimize the RC delay. In manufact...
Grain refinement to the nanocrystalline scale is known to enhance physical properties as strength an...
The process parameters of current density, pulse duration, and cell potential affect both the struct...
In the present work, the gold-nanoplating technique is used to monitor differences in the electroche...
The relationships between grain morphology, preferred orientation, and mechanical performance of com...
Strengthening of electrodeposited gold-based materials is achieved by alloying with copper according...
In this paper, the microstructure and hardness evolutions of commercially pure Cu subjected to high ...
The objective of this work is to investigate the microstrain effect on grain growth and strain relea...
Nanocrystalline materials have generated immense scientific interest, primarily due to observations ...
This article presents a method for the sample preparation and characterisation of bulk copper having...
An ultrafine grained Cu with a wide distribution of grain size and an average grain size of d= 110 n...
This research work presents the first comprehensive study on nanocrystalline materials produced in b...
The mechanical properties of mechanically milled copper and copper-30 iron were studied in the as-mi...
Cu-Ag alloys are promising materials for electrical interconnections due to their combination of hig...
The effect of Cu dissolution during pulse electrodeposition process on the generation of high densit...
Cu interconnects are essential in advanced integrated circuits to minimize the RC delay. In manufact...