MODELING NANOCRYSTALLINE GRAIN GROWTH DURING THE PULSED ELECTRODEPOSITION OF GOLD-COPPER

The process parameters of current density, pulse duration, and cell potential affect both the structure and composition of electrodeposits. The mechanism for nucleation and growth as determined from current transients yield relationships for nucleus density and nucleation rate. To develop an understanding of the role of the process parameters on grain size, as a design structural parameter to control strength for example, a formulation is presented to model the affects of the deposition energy on grain size and morphology. An activation energy for the deposition process is modeled that reveals different growth mechanisms, wherein nucleation and diffusion effects are each dominant as dependent upon pulse duration. A diffusion coefficient common for each of the pulsed growth modes demarcates an observed transition in growth from smooth to rough surfaces