A two-dimensional, two fluid model of the MHD equations has been coupled to a Monte Carlo transport model of high energy, non-Maxwellian ions. The MHD part of the model assumes complete ionization and includes a perfect gas law for a scalar pressure, a tensor artificial viscosity, electron and ion thermal conduction, electron-ion coupling, and a radiation loss term. A simple Ohm's Law is used with a B/sub theta/ magnetic field. The MHD equations were solved in Lagrangian coordinates. The conservation equations were differenced explicitly and the diffusion-type equations implicitly using the splitting technique. The Monte Carlo model solves the equation of motion for high energy ions, moving through and suffering small and large angle collis...
A null collision Monte Carlo method is proposed to calculate the transport kinetics of charged parti...
Recent experiments observing the development of extreme-density plasmas led to a more careful and de...
Plasmas are used extensively in semiconductor manufacturing for etching features and vias, for depos...
The ionization and radiation dynamics of dense magnetohydrodynamic plasmas has been modeled in a fas...
1D and time-dependent multi-fluid plasma models are derived from multi-fluid MHD equations. Includin...
A multifluid magnetohydrodynamic (MHD) model based on an extended fluid dynamics description for eac...
International audienceWe describe the development of a 3D Monte-Carlo model to study hot-electron tr...
Numerical experiments using the Monte Carlo method have led to systematic and accurate results for t...
Recent Monte Carlo calculations from Paris and from Livermore for dense one and two component plasma...
Abstract: New model for a numerical study of the ionizing gas flows in the channel of the ...
International audienceAt very high temperature electrons leave the atom to which they are attached a...
Aims. We present a fluid model that has been developed for multicomponent two-temperature magnetized...
In the present work the basic principles of a MHD channel are described through the development of a...
Abstract: Research of radiation transport in the ionizing gas streams in channel and the c...
The transport of neutral atoms and molecules in the edge and divertor regions of fusion experiments ...
A null collision Monte Carlo method is proposed to calculate the transport kinetics of charged parti...
Recent experiments observing the development of extreme-density plasmas led to a more careful and de...
Plasmas are used extensively in semiconductor manufacturing for etching features and vias, for depos...
The ionization and radiation dynamics of dense magnetohydrodynamic plasmas has been modeled in a fas...
1D and time-dependent multi-fluid plasma models are derived from multi-fluid MHD equations. Includin...
A multifluid magnetohydrodynamic (MHD) model based on an extended fluid dynamics description for eac...
International audienceWe describe the development of a 3D Monte-Carlo model to study hot-electron tr...
Numerical experiments using the Monte Carlo method have led to systematic and accurate results for t...
Recent Monte Carlo calculations from Paris and from Livermore for dense one and two component plasma...
Abstract: New model for a numerical study of the ionizing gas flows in the channel of the ...
International audienceAt very high temperature electrons leave the atom to which they are attached a...
Aims. We present a fluid model that has been developed for multicomponent two-temperature magnetized...
In the present work the basic principles of a MHD channel are described through the development of a...
Abstract: Research of radiation transport in the ionizing gas streams in channel and the c...
The transport of neutral atoms and molecules in the edge and divertor regions of fusion experiments ...
A null collision Monte Carlo method is proposed to calculate the transport kinetics of charged parti...
Recent experiments observing the development of extreme-density plasmas led to a more careful and de...
Plasmas are used extensively in semiconductor manufacturing for etching features and vias, for depos...