Extreme Ultraviolet Laser-based Table-top Aerial Image Metrology of Lithographic Masks
- Brizuela, F.
- Carbajo, S.
- Sakdinawat, A.
- Wang, Y.
- Alessi, D.
- Martz, D.
- Luther, B.
- Goldberg, K. A.
- Attwood, D. T.
- La Fontaine, B.
- Rocca, J.
- Menoni, C.
Publication date
February 2010
DOI Publisher
Lawrence Berkeley National Laboratory ISSN
1094-4087Abstract
We report the first at-wavelength line edge roughness measurements of patterned EUV lithography masks realized using a table-top aerial imaging system based on a table-top {lambda}=13.2 laser
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