Add to ORKGBoron-Nitride films are of interest for their high hardness and wear resistance. Large intrinsic stresses and poor adhesion which often accompany high hardness materials can be moderated through the use of a layered structure. Alternate layers of boron (B) and boron-nitride (BN) are formed by modulating the composition of the sputter gas during deposition from a pure B target. The thin films are characterized with TEM to evaluate the microstructure and with nanoindentation to determine hardness. Layer pair spacing and continuity effects on hardness are evaluated for the B/BN films
c-BN(cubic boron nitride) is known to have extremely high hardness next to diamond, as well as very ...
Intense ion bombardment has been necessary so far to produce cubic boron nitride thin films independ...
AbstractBoron nitride films were deposited onto Si substrates by hot filament chemical vapor deposit...
The oxides and nitrides of boron show great potential for use as hard, wear resistant materials. How...
Boron-nitride (BN) films are deposited by the reactive sputter deposition of fully dense, boron targ...
Nanoindentations, using a triangular based cube-corner shaped diamond tip, were tried to study the m...
Boron nitride (BN) coatings are deposited by the reactive sputtering of fully dense, boron (B) targe...
In today\u27s technological advancement of ULSI integration, the inter-dielectric layer (IDL) with s...
Cubic boron nitride (cBN) films with a thickness of more than 2 µm on silicon and up to 0.8 µm on tu...
xv, 182 leaves : ill. ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P AP 1999 ChanIn this study, w...
A series of boron suboxide films with hardness higher than 40 GPa was prepared and characterized. Th...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
The BCN films were synthesized on Si (110) wafers by using dual ion beam sputtering deposition from ...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
Cubic boron nitride (c-BN) is a material which exhibits similar properties as diamond. Obviously, it...
c-BN(cubic boron nitride) is known to have extremely high hardness next to diamond, as well as very ...
Intense ion bombardment has been necessary so far to produce cubic boron nitride thin films independ...
AbstractBoron nitride films were deposited onto Si substrates by hot filament chemical vapor deposit...
The oxides and nitrides of boron show great potential for use as hard, wear resistant materials. How...
Boron-nitride (BN) films are deposited by the reactive sputter deposition of fully dense, boron targ...
Nanoindentations, using a triangular based cube-corner shaped diamond tip, were tried to study the m...
Boron nitride (BN) coatings are deposited by the reactive sputtering of fully dense, boron (B) targe...
In today\u27s technological advancement of ULSI integration, the inter-dielectric layer (IDL) with s...
Cubic boron nitride (cBN) films with a thickness of more than 2 µm on silicon and up to 0.8 µm on tu...
xv, 182 leaves : ill. ; 30 cm.PolyU Library Call No.: [THS] LG51 .H577P AP 1999 ChanIn this study, w...
A series of boron suboxide films with hardness higher than 40 GPa was prepared and characterized. Th...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
The BCN films were synthesized on Si (110) wafers by using dual ion beam sputtering deposition from ...
Boron carbon nitride (BCN) thin films were deposited by a dual target DC and RF sputtering technique...
Cubic boron nitride (c-BN) is a material which exhibits similar properties as diamond. Obviously, it...
c-BN(cubic boron nitride) is known to have extremely high hardness next to diamond, as well as very ...
Intense ion bombardment has been necessary so far to produce cubic boron nitride thin films independ...
AbstractBoron nitride films were deposited onto Si substrates by hot filament chemical vapor deposit...