High-efficiency transmission gratings fabricated in bulk fused silica

The authors present the design and performance of high-efficiency transmission gratings fabricated in bulk fused silica for use in ultraviolet high-power laser systems. The gratings exhibit a diffraction efficiency exceeding 95% in the m = {minus}1 order and damage threshold greater than 13 J/cm{sup 2} for 1 nsec pulses at 351 nm. Model calculations and experimental measurements are in good agreement. They describe the design and fabrication of these gratings based on the transfer ion etching of photoresist patterns produced by interference lithography