This article discusses high sensitivity measurement of implanted As in the presence of Ge in Ge(x)Si(1-x)/Si layered alloys using trace element accelerator mass spectrometry
Rapid thermal annealing of arsenic implanted Si1-xGex was studied by secondary ion-mass spectroscopy...
The oxidation of silicon is known to inject interstitials, and the presence of silicon–germanium (Si...
Ge1-xSnx is a semiconductor alloy, compatible with silicon technology, with a bandgap tunable with S...
SiGe alloy, owing to its high electron and hole mobility, has potential applications in high-speed m...
Four samples of well-defined silicon-germanium alloys were used as standards for calibration purpose...
Amorphous and relaxed epitaxial GeSi films are prepared by Ge-implantation into Si(111) wafers of bo...
Four samples of well-defined silicon-germanium alloys were used as standards for calibration purpose...
This article discusses low-level copper concentration measurements in silicon wafers using trace-ele...
A mirror polished (111)-oriented Ge single crystal substrate was implanted with 1.0 MeV Si ions to a...
Due to the character of the original source materials and the nature of batch digitization, quality ...
A systematic study on the fluence (5 × 108 − 4 × 1014 cm−2) dependence of ion-implanted As diffusion...
The presence of Silicon-Germanium (SiGe) alloys at the Si/SiO2 interface during oxidation is known t...
The trapping of germanium by silicon atoms, successively implanted into fused silica, is evidenced a...
Si1-xGex layers were formed through high-dose germanium ion implantation into (100)Si substrates. Tw...
Energy-dispersive X-ray spectrometry (EDXS) in the transmission electron microscope (TEM) is applied...
Rapid thermal annealing of arsenic implanted Si1-xGex was studied by secondary ion-mass spectroscopy...
The oxidation of silicon is known to inject interstitials, and the presence of silicon–germanium (Si...
Ge1-xSnx is a semiconductor alloy, compatible with silicon technology, with a bandgap tunable with S...
SiGe alloy, owing to its high electron and hole mobility, has potential applications in high-speed m...
Four samples of well-defined silicon-germanium alloys were used as standards for calibration purpose...
Amorphous and relaxed epitaxial GeSi films are prepared by Ge-implantation into Si(111) wafers of bo...
Four samples of well-defined silicon-germanium alloys were used as standards for calibration purpose...
This article discusses low-level copper concentration measurements in silicon wafers using trace-ele...
A mirror polished (111)-oriented Ge single crystal substrate was implanted with 1.0 MeV Si ions to a...
Due to the character of the original source materials and the nature of batch digitization, quality ...
A systematic study on the fluence (5 × 108 − 4 × 1014 cm−2) dependence of ion-implanted As diffusion...
The presence of Silicon-Germanium (SiGe) alloys at the Si/SiO2 interface during oxidation is known t...
The trapping of germanium by silicon atoms, successively implanted into fused silica, is evidenced a...
Si1-xGex layers were formed through high-dose germanium ion implantation into (100)Si substrates. Tw...
Energy-dispersive X-ray spectrometry (EDXS) in the transmission electron microscope (TEM) is applied...
Rapid thermal annealing of arsenic implanted Si1-xGex was studied by secondary ion-mass spectroscopy...
The oxidation of silicon is known to inject interstitials, and the presence of silicon–germanium (Si...
Ge1-xSnx is a semiconductor alloy, compatible with silicon technology, with a bandgap tunable with S...