Fabrication of Nano Ni Stamp by Pulse Electrodeposition

[[abstract]]本論文研究以奈米壓印與脈衝電鍍製作奈米鎳金屬模具。首先利用E-beam技術製作奈米壓印所需之HSQ模具，接著利用奈米壓印，將模具圖案轉移至PMMA光阻上，然後利用氧電漿去除奈米壓印殘留層；在進行奈米電鍍前，先用微米電鍍實驗，得到一組較佳的電鍍參數，並以此作為奈米電鍍實驗的基礎，同時我們利用這組參數，製作出微米級的可繞式鎳模具，以及具奈米圖形的電鍍鎳模具。 由SEM觀察結果可知，HSQ模具的最小線寬與間距為50nm/100nm，且圖形高度可達140nm，此結果證明我們已可利用EBL的技術製作出高深寬比的高密度奈米圖形；在奈米電鍍鎳模具的製作上我們也成功使用脈衝電鍍製作出線寬150nm和200nm的奈米鎳模具。[[abstract]]A great potential technique for fabricating nano-scale nickel template was demonstrated by combining nanoimprint and pulse electrodeposition. First, HSQ molds were fabricated by E-beam lithography. Then, the patterns of the molds were transferred onto PMMA coated Ni substrate by using nanoimprint, followed by oxygen plasma to remove the residual PMMA and then by pulse electrodeposition to form nickel template. A series of micro-electrodeposition studies were performed to determine a suitable process parameter of nano-electrodeposition. Finally, a flexible micro-scale nickel template and a nano-scale nickel template were fabricated by using this developed technique. According to the observation results of SEM, the minimum line/space width of the HSQ mold was 50nm/100nm with the height of 140nm, and the minimum line width of the nano-scale nickel template was 150 nm after pulse electrodeposition.[[note]]碩