A method of creating a capacitor in an integrated circuit. According to a basic version of the invention the capacitor uses intensive fringing fields to create a capacitance. This is achieved by creating a capacitor with vertical overlapping conducting electrodes between two planes of the integrated circuit, instead of plates parallel to the planes. A capacitor according to the invention can additionally comprise horizontal, i.e. parallel plates. A capacitor according the method is also disclose
[[abstract]]A method for fabricating a capacitor of a DRAM includes a lower conductive layer of the ...
Capacitors are used in almost every activity of electrical engineering, yet information on capacitor...
Capacitance of a Three-Dimensional Interdigitated (MIM) Capacitor The geometry considered here was t...
A method of creating a capacitor in an integrated circuit. According to a basic version of the inven...
A method of manufacturing a capacitor on a wafer, and an IC comprising such a capacitor is disclosed...
[[abstract]]A fabricating method of a capacitor includes two gates and a commonly used source/drain ...
A capacitance arrangement comprising at least one parallel-plate capacitor comprising a first electr...
A capacitor having a stem that is designed to be inserted into a single, large-diameter via hole dri...
A capacitive element is manufactured by using the multilayer printed circuit board technology . The ...
A capacitive structure is made with thin film capacitor plates substantially surrounding an opening ...
[[abstract]]A fabrication method for an integrated device having a capacitor in an interconnect syst...
[[abstract]]A method for forming a dielectric-constant-enhanced capacitor is provided. A wafer in a ...
A capacitor having a floating plate-shaped electrode, at least two patterned plate electrodes overly...
An electronic device includes at least one trench capacitor that can also take the form of an invers...
Abstract − A simple metal-insulator-metal (MIM) capacitor in a standard 0.25 µm digital CMOS process...
[[abstract]]A method for fabricating a capacitor of a DRAM includes a lower conductive layer of the ...
Capacitors are used in almost every activity of electrical engineering, yet information on capacitor...
Capacitance of a Three-Dimensional Interdigitated (MIM) Capacitor The geometry considered here was t...
A method of creating a capacitor in an integrated circuit. According to a basic version of the inven...
A method of manufacturing a capacitor on a wafer, and an IC comprising such a capacitor is disclosed...
[[abstract]]A fabricating method of a capacitor includes two gates and a commonly used source/drain ...
A capacitance arrangement comprising at least one parallel-plate capacitor comprising a first electr...
A capacitor having a stem that is designed to be inserted into a single, large-diameter via hole dri...
A capacitive element is manufactured by using the multilayer printed circuit board technology . The ...
A capacitive structure is made with thin film capacitor plates substantially surrounding an opening ...
[[abstract]]A fabrication method for an integrated device having a capacitor in an interconnect syst...
[[abstract]]A method for forming a dielectric-constant-enhanced capacitor is provided. A wafer in a ...
A capacitor having a floating plate-shaped electrode, at least two patterned plate electrodes overly...
An electronic device includes at least one trench capacitor that can also take the form of an invers...
Abstract − A simple metal-insulator-metal (MIM) capacitor in a standard 0.25 µm digital CMOS process...
[[abstract]]A method for fabricating a capacitor of a DRAM includes a lower conductive layer of the ...
Capacitors are used in almost every activity of electrical engineering, yet information on capacitor...
Capacitance of a Three-Dimensional Interdigitated (MIM) Capacitor The geometry considered here was t...