We present a novel computational scheme to predict chemical compositions at interfaces as they emerge in a growth process. The scheme uses the Gibbs free energy of reaction associated with the formation of interfaces with a specific composition as predictor for their prevalence. It explicitly accounts for the growth conditions by rate-equation modeling of the deposition environment. We illustrate the scheme for characterizing the interface between TiC and alumina
The properties of a material are often strongly influenced by its surfaces. Depending on the nature ...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
AbstractThe ability to apply existing density functional theory-based modeling techniques to timely ...
We present a novel computational schemeto predict chemical compositions at interfacesas they emerge ...
We present a novel computational scheme to predict chemical compositions at interfaces as they emerg...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
This thesis deals with two closely interwoven aspects of first-principle (density functional theory)...
We investigate the chemical composition and adhesion of chemical vapour deposited thin-film alumina ...
International audienceMastering interfacial layers is the current challenge for nanotechnologies whe...
The surface reactivity of various metal precursors with different alkoxide, amide, and alkyl ligands...
Chemical reactions at solid/liquid or solid/gas hybrid interfaces govern the morphogenesis of growi...
Chemical vapor deposition (CVD) processes are often employed to produce high quality materials. In s...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.Includes...
Atomic layer deposition (ALD) and chemical layer deposition (CLD) are techniques to produce conforma...
The properties of a material are often strongly influenced by its surfaces. Depending on the nature ...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
AbstractThe ability to apply existing density functional theory-based modeling techniques to timely ...
We present a novel computational schemeto predict chemical compositions at interfacesas they emerge ...
We present a novel computational scheme to predict chemical compositions at interfaces as they emerg...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
We present a calculational method to predict terminations of growing or as-deposited surfaces as a f...
This thesis deals with two closely interwoven aspects of first-principle (density functional theory)...
We investigate the chemical composition and adhesion of chemical vapour deposited thin-film alumina ...
International audienceMastering interfacial layers is the current challenge for nanotechnologies whe...
The surface reactivity of various metal precursors with different alkoxide, amide, and alkyl ligands...
Chemical reactions at solid/liquid or solid/gas hybrid interfaces govern the morphogenesis of growi...
Chemical vapor deposition (CVD) processes are often employed to produce high quality materials. In s...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1999.Includes...
Atomic layer deposition (ALD) and chemical layer deposition (CLD) are techniques to produce conforma...
The properties of a material are often strongly influenced by its surfaces. Depending on the nature ...
Atomic layer deposition (ALD) is a thin film deposition process based on alternating exposure of pre...
AbstractThe ability to apply existing density functional theory-based modeling techniques to timely ...