The effects of nitrogen incorporation on the atomic-scale structure of amorphous CNx samples have been studied for 0, 5, 20, and 30 at. % N concentration, by x-ray diffraction. Significant differences in the structure are observed on the incorporation of only 5 at. % N, and the changes in structure continue as further N is added. From the experimental data, we are able to obtain directly the average bond distances and then calculate the average bond angles for each of the samples. The average first neighbor distance shows a gradual decrease from 1.55 Angstrom for 0 at. % N, to 1.44 Angstrom for 30 at. % N, and a similar trend is observed in the position of the second neighbor peak. This gives a corresponding increase in the average bond ang...
X-ray scattering from the chemical bond within N2 and CN- has been studied in detail. Differences in...
The electronic structure of nitrogen-containing diamondlike films prepared by sputtering was determi...
Amorphous carbon nitride (a-C:N) films were deposited by reactive direct current magnetron sputterin...
The results of neutron-diffraction experiments performed on two samples of amorphous CNx, with nitro...
The results of neutron and x-ray diffraction experiments performed on a range of nitrogen-doped amor...
Amorphous CNx and CNx:H have been prepared by the ion beam assisted deposition technique. Samples we...
Nitrogen can have numerous effects on diamond-like carbon: it can dope, it can form the hypothetical...
The effect of nitrogen on the valence-electron plasmon energy in amorphous carbon-nitrogen alloys (a...
Amorphous carbon nitride films (a-CN x) with nitrogen concentration ranging from 0 to 30 at.% were p...
This work describes the composition and bonding structure of hydrogenated carbon nitride (a-CNx:H) f...
This work presents the changes induced at the nanometer scale by the nitrogen incorporation into amo...
Amorphous carbon nitride films containing increasing concentrations of nitrogen were deposited by io...
Carbon nitride films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges, were studie...
The chemical bonding and microstructure of dual ion beam-deposited CNx films with nitrogen contents ...
A range of nitrogen-doped amorphous hydrogenated carbon samples (a-C:N-x:H, where x = 3 at.% and x =...
X-ray scattering from the chemical bond within N2 and CN- has been studied in detail. Differences in...
The electronic structure of nitrogen-containing diamondlike films prepared by sputtering was determi...
Amorphous carbon nitride (a-C:N) films were deposited by reactive direct current magnetron sputterin...
The results of neutron-diffraction experiments performed on two samples of amorphous CNx, with nitro...
The results of neutron and x-ray diffraction experiments performed on a range of nitrogen-doped amor...
Amorphous CNx and CNx:H have been prepared by the ion beam assisted deposition technique. Samples we...
Nitrogen can have numerous effects on diamond-like carbon: it can dope, it can form the hypothetical...
The effect of nitrogen on the valence-electron plasmon energy in amorphous carbon-nitrogen alloys (a...
Amorphous carbon nitride films (a-CN x) with nitrogen concentration ranging from 0 to 30 at.% were p...
This work describes the composition and bonding structure of hydrogenated carbon nitride (a-CNx:H) f...
This work presents the changes induced at the nanometer scale by the nitrogen incorporation into amo...
Amorphous carbon nitride films containing increasing concentrations of nitrogen were deposited by io...
Carbon nitride films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges, were studie...
The chemical bonding and microstructure of dual ion beam-deposited CNx films with nitrogen contents ...
A range of nitrogen-doped amorphous hydrogenated carbon samples (a-C:N-x:H, where x = 3 at.% and x =...
X-ray scattering from the chemical bond within N2 and CN- has been studied in detail. Differences in...
The electronic structure of nitrogen-containing diamondlike films prepared by sputtering was determi...
Amorphous carbon nitride (a-C:N) films were deposited by reactive direct current magnetron sputterin...