Abstract: Anatase TiO(2) nanorod films have been prepared on ITO coated glass substrates at room temperature by dc reactive magnetron sputtering technique. The nanorods are highly ordered and are perpendicular to the substrate. XRD measurements show that the anatase nanorods have a preferred orientation along the [110] direction. The prepared nanorods were annealed at different temperatures (200-500 A degrees C) in air for 1 h. The dye-sensitized solar cells (DSSC) have been made using the as-deposited and annealed TiO(2) nanorods as working electrodes. It has been found that annealing improves the efficiency of the DSSC. An optimum conversion efficiency of 2.13%, at 100 mW/cm(2) light intensity has been achieved with TiO(2) nanorods anneal...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It h...
TiO2 nanorods have been prepared on ITO substrates by dc reactive magnetron sputtering technique. Th...
Anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature by ...
The anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
Three different thickness dense TiO2 (150 nm, 300 nm and 450 nm respectively) films were deposited o...
The TiO(2) nanorod arrays, with about 1.8 mu m lengths, have been deposited on ITO substrates by dc ...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
For the first time, the TiO2 nanorod arrays have been prepared on ITO substrates at room temperature...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
TiO2 nanorodswere prepared by DC reactivemagnetron sputtering technique and applied to dye-sensitize...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It h...
TiO2 nanorods have been prepared on ITO substrates by dc reactive magnetron sputtering technique. Th...
Anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature by ...
The anatase TiO2 nanorod films have been prepared on ITO coated glass substrates at room temperature...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
Three different thickness dense TiO2 (150 nm, 300 nm and 450 nm respectively) films were deposited o...
The TiO(2) nanorod arrays, with about 1.8 mu m lengths, have been deposited on ITO substrates by dc ...
TiO2 nanorod films have been deposited on ITO substrates by dc reactive magnetron sputtering techniq...
For the first time, the TiO2 nanorod arrays have been prepared on ITO substrates at room temperature...
TiO2 nanorods were prepared by DC reactive magnetron sputtering technique and applied to dye-sensiti...
TiO2 nanorodswere prepared by DC reactivemagnetron sputtering technique and applied to dye-sensitize...
TiO2 films have been deposited on ITO substrates by dc reactive magnetron sputtering technique. It h...
TiO2 films have been deposited on ITO substrates by DC reactive magnetron sputtering technique. It h...
TiO2 nanorods have been prepared on ITO substrates by dc reactive magnetron sputtering technique. Th...