[[abstract]]A new trap-assisted band-to-band tunneling (TAB) gate current model is proposed to describe the new observed band-to-band tunneling (BBT) induced gate current characteristics of p-channel metal-oxide-semiconductor field effect transistors (PMOSFET's) with ultra-thin gate oxide. Based on this new TAB gate current model, the off-state gate currents of PMOSFET's with various sub-3 nm gate oxides can be well characterized, while the conventional BBT current model is no longer applicable in this regime[[fileno]]2030158010053[[department]]電機工程學
An analytical scheme to combine the channel component and the edge component of direct tunneling cur...
As CMOS electronics grow ever more ubiquitous and essential to modern life, managing and reducing po...
As the physical dimensions of the MOSFET have been scaling, the supply voltage has not scaled accord...
[[abstract]]As MOSFETs are scaled, the gate oxide thickness is becoming smaller and smaller. Gate tu...
We propose a new double-box model of the oxide conduction band of MOS devices, aiming to quantitativ...
We propose a new double-box model of the oxide conduction band of MOS devices, aiming to quantitativ...
A band-to-band tunneling model including trap-assisted tunneling has been implemented in our ensembl...
We propose a new double-box model of the oxide conduction band of MOS devices, aiming to quantitativ...
Abstract—A semi-empirical model is proposed to quantify the tunneling currents through ultrathin gat...
Aggressive scaling of MOS devices requires use of ultra-thin gate oxides to maintain a reasonable sh...
This paper presents a new compact analytical model of the gate leakage current in high-k based nano ...
Two improvements to a comprehensive analytic model which describes the steady-state current in a met...
Power consumption has been among the most important challenges for electronics industry and transist...
For the last few decades, the persistent downscaling of the metal oxide semiconductor field-effect t...
The conventional metal oxide semiconductor field effect transistor (MOSFET)may not be suitable for f...
An analytical scheme to combine the channel component and the edge component of direct tunneling cur...
As CMOS electronics grow ever more ubiquitous and essential to modern life, managing and reducing po...
As the physical dimensions of the MOSFET have been scaling, the supply voltage has not scaled accord...
[[abstract]]As MOSFETs are scaled, the gate oxide thickness is becoming smaller and smaller. Gate tu...
We propose a new double-box model of the oxide conduction band of MOS devices, aiming to quantitativ...
We propose a new double-box model of the oxide conduction band of MOS devices, aiming to quantitativ...
A band-to-band tunneling model including trap-assisted tunneling has been implemented in our ensembl...
We propose a new double-box model of the oxide conduction band of MOS devices, aiming to quantitativ...
Abstract—A semi-empirical model is proposed to quantify the tunneling currents through ultrathin gat...
Aggressive scaling of MOS devices requires use of ultra-thin gate oxides to maintain a reasonable sh...
This paper presents a new compact analytical model of the gate leakage current in high-k based nano ...
Two improvements to a comprehensive analytic model which describes the steady-state current in a met...
Power consumption has been among the most important challenges for electronics industry and transist...
For the last few decades, the persistent downscaling of the metal oxide semiconductor field-effect t...
The conventional metal oxide semiconductor field effect transistor (MOSFET)may not be suitable for f...
An analytical scheme to combine the channel component and the edge component of direct tunneling cur...
As CMOS electronics grow ever more ubiquitous and essential to modern life, managing and reducing po...
As the physical dimensions of the MOSFET have been scaling, the supply voltage has not scaled accord...