[[abstract]]Simple quantitative models of charge displacement due to the quantum effect and its influence on gate oxide thickness measurements are presented. An effective oxide thickness (TDC) is introduced which is relevant to MOSFET current modeling. Physical oxide thickness and TDC can be extracted easily from capacitance measurement, and the electrical thickness can be predicted from a target physical thickness using these new models[[fileno]]2030158030007[[department]]電機工程學
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
Capacitance-voltage (C-V) measurement and analysis is highly useful for determining important inform...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
[[abstract]]As the gate oxide thickness is vigorously scaled down, quantization-induced charge layer...
We propose a compact model which predicts the channel charge density and the drain current which mat...
[[abstract]]A simulator using the coupled Schrodinger equation, the Poisson equation and Fermi-Dirac...
We propose a compact model which predicts the channel charge density and the drain current which mat...
Abstract—In this paper, the effectiveness of the effective potential (EP) method for modeling quantu...
We have deduced the analytical expression of the tunneling current across a thin oxide layer for a M...
We have deduced the analytical expression of the tunneling current across a thin oxide layer for a M...
Abstract:- In this paper, an analytical quantum correction model for ultrathin oxide MOSFET devices ...
We use a full quantum model of MOS (metal oxide semiconductor) structure to study the influence of ...
We use a full quantum model of MOS (metal oxide semiconductor) structure to study the influence of ...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
Capacitance-voltage (C-V) measurement and analysis is highly useful for determining important inform...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
Capacitance-voltage (C-V) measurement and analysis is highly useful for determining important inform...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
[[abstract]]As the gate oxide thickness is vigorously scaled down, quantization-induced charge layer...
We propose a compact model which predicts the channel charge density and the drain current which mat...
[[abstract]]A simulator using the coupled Schrodinger equation, the Poisson equation and Fermi-Dirac...
We propose a compact model which predicts the channel charge density and the drain current which mat...
Abstract—In this paper, the effectiveness of the effective potential (EP) method for modeling quantu...
We have deduced the analytical expression of the tunneling current across a thin oxide layer for a M...
We have deduced the analytical expression of the tunneling current across a thin oxide layer for a M...
Abstract:- In this paper, an analytical quantum correction model for ultrathin oxide MOSFET devices ...
We use a full quantum model of MOS (metal oxide semiconductor) structure to study the influence of ...
We use a full quantum model of MOS (metal oxide semiconductor) structure to study the influence of ...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
Capacitance-voltage (C-V) measurement and analysis is highly useful for determining important inform...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...
Capacitance-voltage (C-V) measurement and analysis is highly useful for determining important inform...
The high frequency CV curves of MOS capacitor have been studied. It is shown that semiclassical mode...