Synthesis and characterization of tris(beta-ketoiminato)ruthenium(III) complexes: Potential precursors for CVD of Ru and RuO2 thin films

[[abstract]]The synthesis and characterization of Ru-III metal complexes [Ru(keim1)(3)] (1) and [Ru(keim2)(3)] (2) are reported, where (keim)H is an abbreviation for the fluorinated ketoimine ligands with formula HOC(CF3)=CHCR=NMe; (keim1)H with R=Me and (keim2)H with R=CF3. These newly synthesized complexes were characterized by spectroscopic methods, while the second complex, 2, was further examined by single-crystal X-ray diffraction (XRD), revealing an octahedral coordination for the Ru cation, with three ketoiminate arranged in a mer-configuration, a consequence of the enhanced steric interaction between ligands. Moreover, both Ru metal complexes show good volatility and thermal stability. CVD experiments were conducted using these complexes at temperatures of 325-450degreesC. The Ru metal and RuO2 thin films on silicon wafers were successfully obtained using either a mixture of 2% O-2 in argon or pure O-2 as the carrier gas, respectively. Our result shows that a 2% O-2 concentration induces the formation of Ru metal, while that only complex 1 gives formation of a columnar RuO2 phase upon switching to pure O-2 as the CVD carrier gas. Scanning electron microscopy (SEM) images were taken to reveal surface morphologies, while X-ray photoelectron spectroscopy (XPS) and XRD were utilized to access their atomic composition as well as the intrinsic packing of the as-deposited thin film materials.[[fileno]]2010302010020[[department]]化學