[[abstract]]The leakage current and the fatigue properties of Pb(Zr, Ti)O3 (PZT) films prepared by rf-magnetron sputtering on (100)-textured LaNiO3 electrode were investigated. Sputtering parameters such as excess PbO content in the target, sputtering power, Ar/O2 ratio, and working pressure were studied. PZT films of the perovskite phase with (100)-preferred orientation can be easily obtained under our sputtering conditions. The optimal sputtering conditions are: 30% excess PbO, sputtering power 40 W, working pressure 5 mTorr, and Ar/O2=95/5. The effect of these sputtering parameters on leakage current and fatigue properties can be explained by the variation of the concentrations of lead vacancies and holes produced by the sputtering cond...
Epitaxial Pb(Zr0.52Ti0.48)O3/La0.7Sr 0.3MnO3(PZT/LSMO) and LSMO/PZT/LSMO heterostructures have been ...
La{sub 0.5}Sr{sub 0.5}CoO{sub 3} (LSCO) thin films have been deposited using RF magnetron sputter-de...
Ferroelectric PZT films were fabricated using an R.F. planar magnetron sputtering technique with 100...
[[abstract]]Thin films of Pb(Zr,Ti)O-3 (PZT) were rf-magnetron sputtered on both (100)-textured LaNi...
Ferroelectric films of lead zirconate titanate (PZT) have been fabricated by rf planar magnetron spu...
Ferroelectric films of lead zirconate titanate (PZT) have been fabricated by rf planar magnetron spu...
[[abstract]]Highly non-(001)-oriented Pb(Zr,Ti)O-3 (PZT) films have been fabricated by rf-magnetron ...
[[abstract]]BaPbO3 (BPO) films were prepared by rf-magnetron sputtering at temperatures as low as 35...
Lead zirconate titanate, a multicomponent ferroelectric oxide has been sputtered using a planar rf m...
[[abstract]]Highly (100)-textured lead barium zirconate (PBZ) thin films of ~0.1 µm and with a compo...
Epitaxial SrRuO{sub 3} thin films were deposited on SrTiO{sub 3}(100) substrates by RF sputtering fo...
PbZr1-xTixO3 (PZT) is one preferred ferroelectric material being used in nonvolatile ferroelectric r...
[[abstract]]Sol-gel-derived thin films of Pb(Zr0.53Ti0.47)O-3 (PZT) were spin-coated onto the (100)-...
The lead zirconate titanate PbZrTiO3 (PZT) of perovskite structure are widely used in the electronic...
[[abstract]]Sputter-deposited LaNiO3 (LNO) was used as a bottom electrode for the deposition of 50-n...
Epitaxial Pb(Zr0.52Ti0.48)O3/La0.7Sr 0.3MnO3(PZT/LSMO) and LSMO/PZT/LSMO heterostructures have been ...
La{sub 0.5}Sr{sub 0.5}CoO{sub 3} (LSCO) thin films have been deposited using RF magnetron sputter-de...
Ferroelectric PZT films were fabricated using an R.F. planar magnetron sputtering technique with 100...
[[abstract]]Thin films of Pb(Zr,Ti)O-3 (PZT) were rf-magnetron sputtered on both (100)-textured LaNi...
Ferroelectric films of lead zirconate titanate (PZT) have been fabricated by rf planar magnetron spu...
Ferroelectric films of lead zirconate titanate (PZT) have been fabricated by rf planar magnetron spu...
[[abstract]]Highly non-(001)-oriented Pb(Zr,Ti)O-3 (PZT) films have been fabricated by rf-magnetron ...
[[abstract]]BaPbO3 (BPO) films were prepared by rf-magnetron sputtering at temperatures as low as 35...
Lead zirconate titanate, a multicomponent ferroelectric oxide has been sputtered using a planar rf m...
[[abstract]]Highly (100)-textured lead barium zirconate (PBZ) thin films of ~0.1 µm and with a compo...
Epitaxial SrRuO{sub 3} thin films were deposited on SrTiO{sub 3}(100) substrates by RF sputtering fo...
PbZr1-xTixO3 (PZT) is one preferred ferroelectric material being used in nonvolatile ferroelectric r...
[[abstract]]Sol-gel-derived thin films of Pb(Zr0.53Ti0.47)O-3 (PZT) were spin-coated onto the (100)-...
The lead zirconate titanate PbZrTiO3 (PZT) of perovskite structure are widely used in the electronic...
[[abstract]]Sputter-deposited LaNiO3 (LNO) was used as a bottom electrode for the deposition of 50-n...
Epitaxial Pb(Zr0.52Ti0.48)O3/La0.7Sr 0.3MnO3(PZT/LSMO) and LSMO/PZT/LSMO heterostructures have been ...
La{sub 0.5}Sr{sub 0.5}CoO{sub 3} (LSCO) thin films have been deposited using RF magnetron sputter-de...
Ferroelectric PZT films were fabricated using an R.F. planar magnetron sputtering technique with 100...