[[abstract]]The real-time feedback control of electron density was performed in an inductively coupled plasma (ICP). A 36 GHz heterodyne interferometer was adopted as the sensor for electron density measurement. The actuator was rf power which drove the ICP antenna. The results show that the electron density in an ICP system is a type 0 system. Therefore, a proportional-integral controller is necessary to eliminate steady-state error. A prefilter was designed to smooth the desired step change of electron density so that the variation of rf power became mild. A feedforward compensator was added to reduce the disturbance effect resulting from pressure change. The experimental results showed that the control system could quickly track the desi...
The electron energy distribution function (EEDF) plays an essential role in non-equilibrium low-temp...
The electron density is a key plasma parameter needed for any process control as well as for underst...
Various RF discharges are widely used in different kinds of production technologies. Still, question...
[[abstract]]Summary form only given. The real-time feedback control has the potential to enhance the...
[[abstract]]Summary form only given. The real-time feedback control has the potential to enhance the...
Real time feedback control of plasma density was developed and carried out in an inductively coupled...
[[abstract]]Here the authors report the development of a fuzzy logic based feedback control of the p...
With an enlargement of the wafer size, development of large-area plasma sources and control of plasm...
Remarkable changes of the electron temperature and the plasma density by increasing bias power were ...
[[abstract]]In this study, we have experimentally demonstrated the real-time closed-loop control of ...
As a first step towards real time, multivariable control of an argon/ oxygen plasma, the implementa...
We present a detailed analysis of an argon inductively coupled plasma in terms of electron density a...
Reponed here is the use of a microwave interferometric technique for making non-intrusive measuremen...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
In contemporary magnetic confinement devices, the density distribution is sensed with interferometer...
The electron energy distribution function (EEDF) plays an essential role in non-equilibrium low-temp...
The electron density is a key plasma parameter needed for any process control as well as for underst...
Various RF discharges are widely used in different kinds of production technologies. Still, question...
[[abstract]]Summary form only given. The real-time feedback control has the potential to enhance the...
[[abstract]]Summary form only given. The real-time feedback control has the potential to enhance the...
Real time feedback control of plasma density was developed and carried out in an inductively coupled...
[[abstract]]Here the authors report the development of a fuzzy logic based feedback control of the p...
With an enlargement of the wafer size, development of large-area plasma sources and control of plasm...
Remarkable changes of the electron temperature and the plasma density by increasing bias power were ...
[[abstract]]In this study, we have experimentally demonstrated the real-time closed-loop control of ...
As a first step towards real time, multivariable control of an argon/ oxygen plasma, the implementa...
We present a detailed analysis of an argon inductively coupled plasma in terms of electron density a...
Reponed here is the use of a microwave interferometric technique for making non-intrusive measuremen...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
In contemporary magnetic confinement devices, the density distribution is sensed with interferometer...
The electron energy distribution function (EEDF) plays an essential role in non-equilibrium low-temp...
The electron density is a key plasma parameter needed for any process control as well as for underst...
Various RF discharges are widely used in different kinds of production technologies. Still, question...