Real-time feedback control of ion energy flux in chlorine inductively coupled plasma for poly-silicon etch process

[[abstract]]The real-time multiple-input multiple-output (MIMO) control of both ion density and ion energy in etching of polysilicon using chlorine inductively coupled plasma was experimentally demonstrated. It was shown that the MIMO control system has a better reproducibility in etch rate as compared to current industrial practice.[[fileno]]2060130030003[[department]]工程與系統科學