[[abstract]]A RF plasma impedance meter was developed to measure the time varying impedance during the power on period of an inductively-coupled pulsed plasma, where a shape adjustable coil and a conventional 13.56 MHz RF power were used. During the power on period, both RF voltage and current on the ICP coil initially increased to a peak value and then slightly decreased up to roughly 1-20% until the power was turned off for all modulations. The relative phase between voltage and current also followed a similar temporal dependence. The real input RF power was also obtained. Measurement results show that neither RF current nor input power is constant even for a square wave modulation.[[fileno]]2060130030001[[department]]工程與系統科學
The time-varying inductance Lp(t) of the system formed by the coaxial electrodes and the current she...
© 2013, American Institute of Aeronautics and Astronautics Inc. All rights reserved. Numerical simul...
This thesis presents the design and application of a Plasma Impedance Monitor (PIM) as a plasma dia...
We report time resolved measurements of the RF current, voltage and complex impedance for pulsed pla...
[[abstract]]Summary form only given. The phenomenon of instabilities in a low pressure inductively c...
Using an electrical model of the plasma reactor, the measurement of the reactor input RF impedance a...
The equivalent impedance of a RF plasma was experimentally determined by monitoring the voltage and ...
A modified Tegal MCR-1 plasma etch system has been electrically characterized, and the plasma impeda...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
Reactive ion etching (RIE) has been used extensively in the last few decades in the microelectronics...
Changes in the ion flux and the time-averaged ion distribution functions are reported for pulsed, in...
[[abstract]]Summary form only given. Pulsed low-pressure high-density plasmas attracted a great deal...
An electron emitting probe in saturated floating potential mode has been used to investigate the tem...
The impedance transition and electron series resonance at an RF bias substrate were observed in 13.5...
The accompanying files contain digital data for figures in the article "Measurement and modeling of ...
The time-varying inductance Lp(t) of the system formed by the coaxial electrodes and the current she...
© 2013, American Institute of Aeronautics and Astronautics Inc. All rights reserved. Numerical simul...
This thesis presents the design and application of a Plasma Impedance Monitor (PIM) as a plasma dia...
We report time resolved measurements of the RF current, voltage and complex impedance for pulsed pla...
[[abstract]]Summary form only given. The phenomenon of instabilities in a low pressure inductively c...
Using an electrical model of the plasma reactor, the measurement of the reactor input RF impedance a...
The equivalent impedance of a RF plasma was experimentally determined by monitoring the voltage and ...
A modified Tegal MCR-1 plasma etch system has been electrically characterized, and the plasma impeda...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
Reactive ion etching (RIE) has been used extensively in the last few decades in the microelectronics...
Changes in the ion flux and the time-averaged ion distribution functions are reported for pulsed, in...
[[abstract]]Summary form only given. Pulsed low-pressure high-density plasmas attracted a great deal...
An electron emitting probe in saturated floating potential mode has been used to investigate the tem...
The impedance transition and electron series resonance at an RF bias substrate were observed in 13.5...
The accompanying files contain digital data for figures in the article "Measurement and modeling of ...
The time-varying inductance Lp(t) of the system formed by the coaxial electrodes and the current she...
© 2013, American Institute of Aeronautics and Astronautics Inc. All rights reserved. Numerical simul...
This thesis presents the design and application of a Plasma Impedance Monitor (PIM) as a plasma dia...