[[abstract]]©1994 Elsevier - Experimental results from DC reactive sputtering of a zinc target for growing zinc oxide films are reported. Special emphasis was placed on conditions to obtain films with excess zinc and its effects on film structures. Results suggested that competition between oxidation of the zinc target and its rate of being sputtered away plays a critical role in deciding the stoichiometry of grown films. This competition, in turn, results from the coupled effects of DC power and oxygen fraction in the chamber. A higher oxygen fraction is needed to produce transparent, stoichiometric and highly oriented films. Data showed that when a slight excess of zinc was included in the ZnO film, its color (i.e. transparency) and colum...
Zinc oxide thin films were sputter deposited on (100) silicon substrates at 250 ○C substrates tempe...
AbstractAluminum doped zinc oxide (AZO) thin films were prepared by direct current (DC) magnetron sp...
A spray pyrolytic system was used to obtain ZnO:X films doped with different elements, X = Al, In, C...
This thesis reports the first detailed study of the stoichiometry control mechanisms and physical pr...
Polycrystalline ZnO films were deposited on quartz substrates by reactive sputtering of zinc target....
Reactively sputtered zinc oxide thin films exhibit low crystalline order when deposited on unheated ...
International audienceReactively sputtered Zinc Oxide thin films exhibit low crystalline order when ...
International audienceTransparent conductive oxides are materials combining great transparency with ...
Chemical bath deposition of ZnO thin films using six different complexing agents, namely ammonia, hy...
AbstractNano-structured zinc oxide thin films were deposited on corning glass substrate by magnetron...
Chemical bath deposition of ZnO thin films using six different complexing agents, namely ammonia, hy...
Zinc oxide (ZnO) films with c-oriented were grown on fused quartz glass substrates at room temperatu...
Zinc oxide (ZnO) films with different structural, morphological, and optical properties were obtaine...
Zinc Aluminum Oxide (ZAO) thin films were prepared by DC reactive magnetron sputtering on glass subs...
We report on our efforts to deposit transparent, conducting, zinc oxide films by reactive sputtering...
Zinc oxide thin films were sputter deposited on (100) silicon substrates at 250 ○C substrates tempe...
AbstractAluminum doped zinc oxide (AZO) thin films were prepared by direct current (DC) magnetron sp...
A spray pyrolytic system was used to obtain ZnO:X films doped with different elements, X = Al, In, C...
This thesis reports the first detailed study of the stoichiometry control mechanisms and physical pr...
Polycrystalline ZnO films were deposited on quartz substrates by reactive sputtering of zinc target....
Reactively sputtered zinc oxide thin films exhibit low crystalline order when deposited on unheated ...
International audienceReactively sputtered Zinc Oxide thin films exhibit low crystalline order when ...
International audienceTransparent conductive oxides are materials combining great transparency with ...
Chemical bath deposition of ZnO thin films using six different complexing agents, namely ammonia, hy...
AbstractNano-structured zinc oxide thin films were deposited on corning glass substrate by magnetron...
Chemical bath deposition of ZnO thin films using six different complexing agents, namely ammonia, hy...
Zinc oxide (ZnO) films with c-oriented were grown on fused quartz glass substrates at room temperatu...
Zinc oxide (ZnO) films with different structural, morphological, and optical properties were obtaine...
Zinc Aluminum Oxide (ZAO) thin films were prepared by DC reactive magnetron sputtering on glass subs...
We report on our efforts to deposit transparent, conducting, zinc oxide films by reactive sputtering...
Zinc oxide thin films were sputter deposited on (100) silicon substrates at 250 ○C substrates tempe...
AbstractAluminum doped zinc oxide (AZO) thin films were prepared by direct current (DC) magnetron sp...
A spray pyrolytic system was used to obtain ZnO:X films doped with different elements, X = Al, In, C...