pn-Junctions of MEH-PPV on top of heavily doped n-type silicon were used in electrical measurements. Through deep-level transient-spectroscopy (DLTS)-like measurements, four traps (two majority and two minority traps) could be identified on top of the shallow acceptor level responsible for conduction. Furthermore, evidence is found for interface states. (C) 2000 Published by Elsevier Science S.A. All rights reserved
In this thesis we demonstrate the in situ electrical characterization of planar, high concentration ...
Several methods of characterization of trap levels like I-V, C-V and transient spectroscopy (DLTS) w...
Low resistivity, near-surface doping in silicon represents a formidable challenge for both the micro...
pn-Junctions of MEH-PPV on top of heavily doped n-type silicon were used in electrical measurements....
The relation between gold related levels in silicon is studied with deep level transient spectroscop...
Deep Level Transient Spectroscopy (DLTS) has been applied to Metal-Insulator-Semiconductor (MIS) cap...
International audienceIt is well established that low energy B+ ion implantation into Ge- (or Si) im...
Electron stares at a solid C-60/Si(111) interface have been studied by the deep-level transient spec...
The deep-level traps in Si substrates caused by the shallow trench isolation (STI) process have been...
The presence of carrier traps, at the Si-SiO2 interface, is at the origin of various instability phe...
A method for accurate measurement of deep levels in a thin silicon-on-insulator (SOI) layer by the c...
Optical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existenc...
Transconductance measurements have been used to characterize the space-charge regions of various n-S...
Abstract – Both the collected charge and capacitance of a silicon detector is proportional to the de...
Energy exchange mechanisms of electron and hole recombination at deep level traps in semiconductors ...
In this thesis we demonstrate the in situ electrical characterization of planar, high concentration ...
Several methods of characterization of trap levels like I-V, C-V and transient spectroscopy (DLTS) w...
Low resistivity, near-surface doping in silicon represents a formidable challenge for both the micro...
pn-Junctions of MEH-PPV on top of heavily doped n-type silicon were used in electrical measurements....
The relation between gold related levels in silicon is studied with deep level transient spectroscop...
Deep Level Transient Spectroscopy (DLTS) has been applied to Metal-Insulator-Semiconductor (MIS) cap...
International audienceIt is well established that low energy B+ ion implantation into Ge- (or Si) im...
Electron stares at a solid C-60/Si(111) interface have been studied by the deep-level transient spec...
The deep-level traps in Si substrates caused by the shallow trench isolation (STI) process have been...
The presence of carrier traps, at the Si-SiO2 interface, is at the origin of various instability phe...
A method for accurate measurement of deep levels in a thin silicon-on-insulator (SOI) layer by the c...
Optical charging spectroscopy (OCS) is first time reported as applied to p-n junctions. The existenc...
Transconductance measurements have been used to characterize the space-charge regions of various n-S...
Abstract – Both the collected charge and capacitance of a silicon detector is proportional to the de...
Energy exchange mechanisms of electron and hole recombination at deep level traps in semiconductors ...
In this thesis we demonstrate the in situ electrical characterization of planar, high concentration ...
Several methods of characterization of trap levels like I-V, C-V and transient spectroscopy (DLTS) w...
Low resistivity, near-surface doping in silicon represents a formidable challenge for both the micro...