2003-2004 > Academic research: refereed > Publication in refereed journalVersion of RecordPublishe
The translational gas temperature was measured in 13.56 MHz radio-frequency (rf) discharges in CF4 a...
The behavior of CF sub 2 radicals in CF4/O2 plasmas has been studied as a function of the oxygen par...
Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plas...
Broadband ultraviolet absorption spectroscopy has been used to determine CF2 densities in a plasma e...
Infrared absorption spectroscopy has been used to measure the absolute densities of neutral particle...
Densities of CF 2 radicals, rotational temperatures, and the degree of dissociation in radio-frequen...
Infrared absorption spectroscopy has been used to determine the vibrational and rotational excitatio...
International audienceVacuum ultraviolet-absorption spectroscopy (AS) and emission spectroscopy (ES)...
CF4 plasmas have a number of industrial applications. To improve our understanding of the elementary...
Plasmas used for the manufacturing of semiconductor devices are similar in pressure and temperature ...
The plasma of a CF4-quartz etching system is investigated with optical methods. The presence of CF2,...
The translational gas temperature was measured in 13.56 MHz radio-frequency (rf) discharges in CF4 a...
The behavior of CF sub 2 radicals in CF4/O2 plasmas has been studied as a function of the oxygen par...
Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plas...
Broadband ultraviolet absorption spectroscopy has been used to determine CF2 densities in a plasma e...
Infrared absorption spectroscopy has been used to measure the absolute densities of neutral particle...
Densities of CF 2 radicals, rotational temperatures, and the degree of dissociation in radio-frequen...
Infrared absorption spectroscopy has been used to determine the vibrational and rotational excitatio...
International audienceVacuum ultraviolet-absorption spectroscopy (AS) and emission spectroscopy (ES)...
CF4 plasmas have a number of industrial applications. To improve our understanding of the elementary...
Plasmas used for the manufacturing of semiconductor devices are similar in pressure and temperature ...
The plasma of a CF4-quartz etching system is investigated with optical methods. The presence of CF2,...
The translational gas temperature was measured in 13.56 MHz radio-frequency (rf) discharges in CF4 a...
The behavior of CF sub 2 radicals in CF4/O2 plasmas has been studied as a function of the oxygen par...
Laser induced fluorescence has been used to detect ground-state CF and CF2 radicals in a CF4/O2 plas...
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