Add to ORKGpeer-reviewedThis paper describes the modelling and simulation of two resolution enhancement techniques in lithography ; 1) phase shift mask (PSM) technology and 2) top surface imaging (TSI) with silylation and dry development. The effect of the duty ratio on the image contrast is computed. Simulated one and two dimensional rim shifters and attenuated PSMs are presented. The effect of the aerial image on the silylation profile for the top imaging processes, DESIRE and PRIME, is also presented. The effect of the first etch step on the final resist profiles is examined. The partial pressure and the presence of magnetic fields are also presented
Silylation is a surface imaging technique which allows silicon to absorb into photoresist in specifi...
peer-reviewedIn this paper, liquid-phase silylation process for Top Surface Imaging Lithography sys...
Most surface imaging resist processes are based on selective incorporation of silicon during silylat...
Optical lithography has been the key enabling technology for scaling down dimensions of devices on V...
Optical lithography has been the key enabling technology for scaling down dimensions of devices on V...
The use of statistically designed experiments provide an efficient method of investigating a lithogr...
Each new technology node tests the limits of optical Lithography. As exposure wavelength is reduced,...
The goal of this project is to design, fabricate, and characterize alternating phase shift masks for...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
Abstract-The phase-shifting mask consists of a normal transmission mask that has been coated with a ...
As device continues to shrink beyond the theoretical limit of the optical exposure tools, other opti...
As device continues to shrink beyond the theoretical limit of the optical exposure tools, other opti...
Silylation is a surface imaging technique which allows silicon to absorb into photoresist in specifi...
In this paper I present the impact of sub-wavelength optical lithography for new EDA tools, IC Layou...
Silylation is a surface imaging technique which allows silicon to absorb into photoresist in specifi...
peer-reviewedIn this paper, liquid-phase silylation process for Top Surface Imaging Lithography sys...
Most surface imaging resist processes are based on selective incorporation of silicon during silylat...
Optical lithography has been the key enabling technology for scaling down dimensions of devices on V...
Optical lithography has been the key enabling technology for scaling down dimensions of devices on V...
The use of statistically designed experiments provide an efficient method of investigating a lithogr...
Each new technology node tests the limits of optical Lithography. As exposure wavelength is reduced,...
The goal of this project is to design, fabricate, and characterize alternating phase shift masks for...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
Simulation of lithographic processes in semiconductor manufacturing has gone from a crude learning t...
Abstract-The phase-shifting mask consists of a normal transmission mask that has been coated with a ...
As device continues to shrink beyond the theoretical limit of the optical exposure tools, other opti...
As device continues to shrink beyond the theoretical limit of the optical exposure tools, other opti...
Silylation is a surface imaging technique which allows silicon to absorb into photoresist in specifi...
In this paper I present the impact of sub-wavelength optical lithography for new EDA tools, IC Layou...
Silylation is a surface imaging technique which allows silicon to absorb into photoresist in specifi...
peer-reviewedIn this paper, liquid-phase silylation process for Top Surface Imaging Lithography sys...
Most surface imaging resist processes are based on selective incorporation of silicon during silylat...