This presentation reviews recent lattice location studies of RE ions in GaN by electron emission channelling (EC) and X-ray absorption fine structure (XAFS) techniques. These studies agree that RE ions at low concentrations (whether they are incorporated during growth or introduced later by ion implantation) predominantly occupy Ga substitutional sites, as expected from considerations of charge equivalence. We combine this result with some examples of the welldocumented richness of optical spectra of GaN:RE3+ to suggest that the luminescence of these materials may be ascribed to a family of rather similar sites, all of which feature the REGa defect
Studies on the optically active rare earth (RE) ions doped III-nitrides QWs and SLs are very scarce,...
The wide band gap semiconductor, GaN, has emerged as an important host for rare earth-electrolumines...
The implantation damage and rare earth (RE) luminescence in the wide band gap ternaries AlGaN and Al...
This presentation reviews recent lattice location studies of rare earth (RE) ions in GaN by electron...
Rare earth (RE) ions implanted GaN films were studied by optical spectroscopy and RBS techniques. Sh...
Rare-earth (RE) doped III-nitrides, prepared by in-situ doping during growth or by ion implantation ...
Wide band-gap semiconductors, particularly III-nitrides, became one of the most studied materials du...
This paper reviews the current knowledge on rare earths (REs) implanted into GaN with a special focu...
The behavior of rare earth dopants in GaN was investigated by means of theoretical techniques. The D...
The group III nitrides comprise the semiconducting materials InN, GaN, AlN and their ternary alloys....
Study of the luminescence of Rare Earth ions introduced into III-nitride semiconductor hosts produce...
We review theoretical investigations into the structure and electrical activity of rare earth (RE) d...
Knowledge from lanthanide spectroscopy on wide band gap (6–10?eV) inorganic compounds is used to und...
Implanted radioactive /sup 167/Tm//sup 167/Er and /sup 169/Yb//sup 169/Tm impurities in Si and GaN w...
The group III nitrides (GaN, InN, AlN ) are semiconductors with a large band gap, which can be adjus...
Studies on the optically active rare earth (RE) ions doped III-nitrides QWs and SLs are very scarce,...
The wide band gap semiconductor, GaN, has emerged as an important host for rare earth-electrolumines...
The implantation damage and rare earth (RE) luminescence in the wide band gap ternaries AlGaN and Al...
This presentation reviews recent lattice location studies of rare earth (RE) ions in GaN by electron...
Rare earth (RE) ions implanted GaN films were studied by optical spectroscopy and RBS techniques. Sh...
Rare-earth (RE) doped III-nitrides, prepared by in-situ doping during growth or by ion implantation ...
Wide band-gap semiconductors, particularly III-nitrides, became one of the most studied materials du...
This paper reviews the current knowledge on rare earths (REs) implanted into GaN with a special focu...
The behavior of rare earth dopants in GaN was investigated by means of theoretical techniques. The D...
The group III nitrides comprise the semiconducting materials InN, GaN, AlN and their ternary alloys....
Study of the luminescence of Rare Earth ions introduced into III-nitride semiconductor hosts produce...
We review theoretical investigations into the structure and electrical activity of rare earth (RE) d...
Knowledge from lanthanide spectroscopy on wide band gap (6–10?eV) inorganic compounds is used to und...
Implanted radioactive /sup 167/Tm//sup 167/Er and /sup 169/Yb//sup 169/Tm impurities in Si and GaN w...
The group III nitrides (GaN, InN, AlN ) are semiconductors with a large band gap, which can be adjus...
Studies on the optically active rare earth (RE) ions doped III-nitrides QWs and SLs are very scarce,...
The wide band gap semiconductor, GaN, has emerged as an important host for rare earth-electrolumines...
The implantation damage and rare earth (RE) luminescence in the wide band gap ternaries AlGaN and Al...