In the last couple decades, the phenomenal growth of mobile electronics is fueling thedemand for multi-functional, high performance and ultra-low power integrated circuits.Reduction in Vdd to achieve orders of magnitude reduction of energy consumption is crucial if the promise of many more decades of growth of electronics usage is to be realized. For MOSFETs, Vdd reduction can only be achieved at the expense of speed loss and/or off-state leakage increase because the subthreshold slope is fundamentally limited to 60mV/decade. New transistors with sub-60mV/dec swing allowing Vdd scaling to 0.3V and below are therefore highly desirable.In this research, two approaches to achieve transistors with sub-60mV/dec swing areexplored. Feedback FET (F...
The long-standing tug-of-war between off-state leakage power consumption and switching speed has po...
Negative capacitance field effect transistors (NCFETs) are modeled in this study, with an emphasis o...
With the scaling of the transistor, fabrication of an actual device and modeling of an ultra-short c...
Conventional device scaling has been the main guiding principle of the MOS device engineering over t...
Conventional Field Effect Transistor (FET) are well known to require at least 60mV/decade at 300K ch...
One of the major roadblocks in the continued scaling of standard CMOS technology is its alarmingly h...
The progress of state-of-art electronics requires CMOS technology to be more powerful and power effi...
In this work, we propose and investigate the high performance and low power design space of non-hyst...
This work experimentally demonstrates, for the first time, that by integrating a thin ferroelectric ...
The Boltzmann distribution of electrons sets a fundamental barrier to lowering energy consumption in...
The negative-capacitance field-effect transistor(NC-FET) has attracted tremendous research efforts. ...
Boltzmann electron energy distribution poses a fundamental limit to lowering the energy dissipation ...
Abstract Simply including either single ferroelectric oxide layer or threshold selector, we can make...
International audienceThe reduction of the supply voltage is standard MOSFETs is impeded by the subt...
With the continued scaling of field-effect transistors (FETs) we have past the point where short-cha...
The long-standing tug-of-war between off-state leakage power consumption and switching speed has po...
Negative capacitance field effect transistors (NCFETs) are modeled in this study, with an emphasis o...
With the scaling of the transistor, fabrication of an actual device and modeling of an ultra-short c...
Conventional device scaling has been the main guiding principle of the MOS device engineering over t...
Conventional Field Effect Transistor (FET) are well known to require at least 60mV/decade at 300K ch...
One of the major roadblocks in the continued scaling of standard CMOS technology is its alarmingly h...
The progress of state-of-art electronics requires CMOS technology to be more powerful and power effi...
In this work, we propose and investigate the high performance and low power design space of non-hyst...
This work experimentally demonstrates, for the first time, that by integrating a thin ferroelectric ...
The Boltzmann distribution of electrons sets a fundamental barrier to lowering energy consumption in...
The negative-capacitance field-effect transistor(NC-FET) has attracted tremendous research efforts. ...
Boltzmann electron energy distribution poses a fundamental limit to lowering the energy dissipation ...
Abstract Simply including either single ferroelectric oxide layer or threshold selector, we can make...
International audienceThe reduction of the supply voltage is standard MOSFETs is impeded by the subt...
With the continued scaling of field-effect transistors (FETs) we have past the point where short-cha...
The long-standing tug-of-war between off-state leakage power consumption and switching speed has po...
Negative capacitance field effect transistors (NCFETs) are modeled in this study, with an emphasis o...
With the scaling of the transistor, fabrication of an actual device and modeling of an ultra-short c...