Extracting mechanical and microstructural properties of Cu–Zr thin film alloys by MEMS, AFM and ellipsometer

The quantification of the atomic concentration ratios of thin-film metallic alloys having low atomic ordering is challenging, particularly if they are grown on similar metals and possess different surface chemistries. Micromechanical and optical methods have been used to correlate the elemental ratios with the mechanical and optical properties of the films. The room-temperature growth of Cu–Zn thin-film alloys with varying elemental ratios on cosputtered Si substrates was performed to obtain an amorphous film structure. X-ray diffraction patterns confirmed that the grown films exhibited a very short range ordering, suggesting an amorphous structure. The mechanical properties of the films evaluated using microelectromechanical system (MEMS) indicated that the alloy films with moderate Zr concentrations had lower surface stress compared to those with low and high Zr concentrations. Furthermore, spectroscopic ellipsometry was employed to qualitatively assess the relaxation times of free carriers. The results demonstrated a strong correlation between the relaxation times and surface roughness measurements, showing that the microstructure and resistivity characteristics of the alloys align with the Nordheim semiempirical model. The extinction coefficient of the binary alloy film linearly depends on the metallic bulk concentration ratio in a specific metallic ratio range, paving the way for realizing qualitative elemental percentage assessment in the field of metrology