rights: 社団法人照明学会 rights: 本文データは学協会の許諾に基づきCiNiiから複製したものである relation: isVersionOf: http://ci.nii.ac.jp/naid/110004587052
An ion-beam sputtering (IBS) system has been designed and developed for preparing thin films and mul...
Various processes can generate energetic particles suitable for thin film deposition. In some more c...
This report deals with ITO (indium tin oxide) deposition by ion-beam sputtering, and was custom-made...
rights: 社団法人照明学会rights: 本文データは学協会の許諾に基づきCiNiiから複製したものであるrelation: isVersionOf: http://ci.nii.ac.jp/n...
运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工...
SIGLEAvailable from British Library Document Supply Centre- DSC:D062695 / BLDSC - British Library Do...
There are several methods for growing single crystalline thin layers: chemical vapour deposition (CV...
Ion beam sputter deposition (IBSD) is an established physical vapour deposition technique that offer...
The parameters of a reactive ion-beam sputter deposition system have to be optimized to achive layer...
Optical thin films are nowadays major obstacles in deep UV lithography. Scattering and absorption lo...
Reactive ion-beam sputter deposition is the preferred method to fabricate stoichiometric and dense l...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
SIGLEAvailable from British Library Document Supply Centre- DSC:DXN002172 / BLDSC - British Library ...
Currently, optical coating technology is facing a multitude of new challenges. Some of the new requi...
The method and parameters of TiN film deposition processes are of dominant influence on the film gro...
An ion-beam sputtering (IBS) system has been designed and developed for preparing thin films and mul...
Various processes can generate energetic particles suitable for thin film deposition. In some more c...
This report deals with ITO (indium tin oxide) deposition by ion-beam sputtering, and was custom-made...
rights: 社団法人照明学会rights: 本文データは学協会の許諾に基づきCiNiiから複製したものであるrelation: isVersionOf: http://ci.nii.ac.jp/n...
运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工...
SIGLEAvailable from British Library Document Supply Centre- DSC:D062695 / BLDSC - British Library Do...
There are several methods for growing single crystalline thin layers: chemical vapour deposition (CV...
Ion beam sputter deposition (IBSD) is an established physical vapour deposition technique that offer...
The parameters of a reactive ion-beam sputter deposition system have to be optimized to achive layer...
Optical thin films are nowadays major obstacles in deep UV lithography. Scattering and absorption lo...
Reactive ion-beam sputter deposition is the preferred method to fabricate stoichiometric and dense l...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
SIGLEAvailable from British Library Document Supply Centre- DSC:DXN002172 / BLDSC - British Library ...
Currently, optical coating technology is facing a multitude of new challenges. Some of the new requi...
The method and parameters of TiN film deposition processes are of dominant influence on the film gro...
An ion-beam sputtering (IBS) system has been designed and developed for preparing thin films and mul...
Various processes can generate energetic particles suitable for thin film deposition. In some more c...
This report deals with ITO (indium tin oxide) deposition by ion-beam sputtering, and was custom-made...