Within this report, experiments were conducted to determine what effects temperature has on thin film composition, crystalline orientation, and roughness. Ruthenium Oxide (RuO2) thin films were grown using pulsed laser deposition with different substrate temperatures (100, 200, 300). The properties of the thin films were observed using X-Ray diffraction, scanning electron microscopy, and atomic force microscopy measurements. It has been observed that the increase in temperature causes an increase in density, and roughness. The RuO2 thin films made at 500℃ are able to form on a substrate with strong crystalline orientation. This information can become vital in how thin films are made for their intended purpose
For next generation Extreme UV photolithography, multilayer coatings may require protective capping ...
Strontium ruthenium oxide (SrRuO3) thin films have been grown using pulsed laser deposition techniqu...
Some unique characteristics of epitaxial growth of oxide thin films prepared by pulsed laser deposit...
In this study, the growth characteristics and the film properties of Ru and RuO2 thin films were sys...
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)rut...
RuO2 thin films have been produced on silicon-based substrates by in situ pulsed laser deposition fo...
For growth temperatures in the range of 275 C to 425 C, highly conductive RuO{sub 2} thin films with...
K0.87RhO2 thin films were prepared by pulsed laser deposition on fused silica substrates under diffe...
SrMg^Rui-iOa thin films were made by using pulsed laser deposition on SrTiOa (100) substrates in ei...
Pulsed chemical vapor deposition was used to prepare epitaxial ruthenium dioxide (RuO2) film on ruti...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
We have prepared thin RuO2 films by thermal evaporation metal organic chemical vapour deposition on ...
Thin ruthenium oxide film deposition on 100 nm SiO2 substrate by thermal atomic layer deposition (AL...
Ruthenium oxide (nominally RuO2) layers 1 - 2 \u3bcm thick were prepared at 300, 400, 500 and 600 \u...
For next generation Extreme UV photolithography, multilayer coatings may require protective capping ...
Strontium ruthenium oxide (SrRuO3) thin films have been grown using pulsed laser deposition techniqu...
Some unique characteristics of epitaxial growth of oxide thin films prepared by pulsed laser deposit...
In this study, the growth characteristics and the film properties of Ru and RuO2 thin films were sys...
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)rut...
RuO2 thin films have been produced on silicon-based substrates by in situ pulsed laser deposition fo...
For growth temperatures in the range of 275 C to 425 C, highly conductive RuO{sub 2} thin films with...
K0.87RhO2 thin films were prepared by pulsed laser deposition on fused silica substrates under diffe...
SrMg^Rui-iOa thin films were made by using pulsed laser deposition on SrTiOa (100) substrates in ei...
Pulsed chemical vapor deposition was used to prepare epitaxial ruthenium dioxide (RuO2) film on ruti...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
Thin films of zirconium oxide have been deposited using pulsed laser deposition on Zr-base alloy sub...
We have prepared thin RuO2 films by thermal evaporation metal organic chemical vapour deposition on ...
Thin ruthenium oxide film deposition on 100 nm SiO2 substrate by thermal atomic layer deposition (AL...
Ruthenium oxide (nominally RuO2) layers 1 - 2 \u3bcm thick were prepared at 300, 400, 500 and 600 \u...
For next generation Extreme UV photolithography, multilayer coatings may require protective capping ...
Strontium ruthenium oxide (SrRuO3) thin films have been grown using pulsed laser deposition techniqu...
Some unique characteristics of epitaxial growth of oxide thin films prepared by pulsed laser deposit...