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sputteringSoftware
pulsed laser depositionTopical concept
Results on the bulk and surface magnetic behavior of Fe-Si-B-C amorphous thin films, with thickness in the range of 80 – 250 nm, deposited onto glass substrates using RF sputtering and pulsed laser deposition techniques are presented. In the as-deposited state the coercivity of the samples prepared by pulsed laser deposition is higher than of the RF sputtered samples. The obtained results show a small difference between bulk and surface magnetic behaviour. The thermal treatments reduce both surface and bulk coercivity values
Thin films of nominal composition Fe84.3Si4P3B8Cu0.7 have been prepared by sputtering from ribbons o...
An annealing technique based on electrical current heating is extended from the case of metallic rib...
International audienceNd-Fe-B thin films have been successfully developed by Pulsed Laser Deposition...
Results on the bulk and surface magnetic behavior of Fe-Si-B-C amorphous thin films, with thickness ...
Soft magnetic Fe-Cu-Nb-Si-B amorphous thin films with thickness ranging between 100-200 nm have been...
Soft magnetic thin films of FeCuNbSiB alloy having different thickness were deposited on a Si3N4 sub...
Soft magnetic multicomponent Co-Fe-Ni-Si-B thin films have been grown by pulsed laser deposition ont...
Co67Fe4Si14.5B14.5 amorphous thin films have been produced by rf sputtering with thickness varying f...
Magnetic films were deposited on oxidized Si by KrF laser ablation of amorphous ribbons (composition...
A dc-triode sputtering technique has been applied to produce bulk amorphous alloys at very high depo...
Fe thin films have been deposited by thermal evaporation onto glass substrate. The thickness ranges ...
Fe73.9Cu1Nb3Si13.2B8.9 (Finemet) thin films were deposited on the glass substrates by means of radio...
Using the pulsed laser ablation technique, Fe73.5Cu1Nb3Si15.5B7 amorphous thin films, with smooth an...
Fe73.9Cu1Nb3Si13.2B8.9 (Finemet) thin films were deposited on the glass substrates by means of radio...
Soft magnetic materials are currently used in a variety of applications in electrical machines, sens...
Thin films of nominal composition Fe84.3Si4P3B8Cu0.7 have been prepared by sputtering from ribbons o...
An annealing technique based on electrical current heating is extended from the case of metallic rib...
International audienceNd-Fe-B thin films have been successfully developed by Pulsed Laser Deposition...
Results on the bulk and surface magnetic behavior of Fe-Si-B-C amorphous thin films, with thickness ...
Soft magnetic Fe-Cu-Nb-Si-B amorphous thin films with thickness ranging between 100-200 nm have been...
Soft magnetic thin films of FeCuNbSiB alloy having different thickness were deposited on a Si3N4 sub...
Soft magnetic multicomponent Co-Fe-Ni-Si-B thin films have been grown by pulsed laser deposition ont...
Co67Fe4Si14.5B14.5 amorphous thin films have been produced by rf sputtering with thickness varying f...
Magnetic films were deposited on oxidized Si by KrF laser ablation of amorphous ribbons (composition...
A dc-triode sputtering technique has been applied to produce bulk amorphous alloys at very high depo...
Fe thin films have been deposited by thermal evaporation onto glass substrate. The thickness ranges ...
Fe73.9Cu1Nb3Si13.2B8.9 (Finemet) thin films were deposited on the glass substrates by means of radio...
Using the pulsed laser ablation technique, Fe73.5Cu1Nb3Si15.5B7 amorphous thin films, with smooth an...
Fe73.9Cu1Nb3Si13.2B8.9 (Finemet) thin films were deposited on the glass substrates by means of radio...
Soft magnetic materials are currently used in a variety of applications in electrical machines, sens...
Thin films of nominal composition Fe84.3Si4P3B8Cu0.7 have been prepared by sputtering from ribbons o...
An annealing technique based on electrical current heating is extended from the case of metallic rib...
International audienceNd-Fe-B thin films have been successfully developed by Pulsed Laser Deposition...
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