Electrochromic (EC) properties of sputtered Ni oxide films have been examined in KCl + H_2SO_4 acidic aqueous solutions. KCl concentration was kept constant at 1M while H_2SO_4 concentrations were varied from 0 to 50 mM. EC coloration efficiency was found to be approximately 30 cm^2/C in all the solutions, and maximum charge capacity and maximum change in optical density were obtained in a 1M KCl solution with 0.5 mM H_2SO_4. Intercalation of hydrogen ions into NiO grains is believed to be the reason for the improvement of charge capacity and optical density change. These results offer support for the practical construction of efficient complementary EC devices using dilute acidic aqueous electrolytes
Porous Ni oxide thin films were deposited on unheated ITO/glass substrates by sputtering in argon-ox...
Nickel oxide thin films, known as optically active counter electrodes in electrochromic devices, wer...
Electrochromic (EC) films of nickel oxide, with and without vanadium, were prepared by reactive dc...
Electrochromic (EC) properties of sputtered Ni oxide films have been examined in 1M KCl + H2SO4 acid...
Thin films of Ni oxide, which is a promising anodic electrochromic material, were deposited by react...
Nickel oxyhydroxide (NiOOH) thin films were prepared by reactive sputtering using H2O as a reactive ...
Thin films of Ni oxide, which is a promising anodic electrochromic material, were deposited by react...
A half cell of an electrochromic (EC) device has been used to determine theelectrochromic response o...
ve be ations rge ca hydro hese olytes 118 A eceive ous solutions for use as the ion-conducting laye...
The effect of sputtering power (=60 W–180 W) on the electrochromic properties of nickel oxide films ...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Electrochromic properties of sputter-deposited nickel-based oxide films have been studied with a two...
Porous Ni oxide thin films were deposited on unheated ITO/glass substrates by sputtering in argon-ox...
Nickel oxide thin films, known as optically active counter electrodes in electrochromic devices, wer...
Electrochromic (EC) films of nickel oxide, with and without vanadium, were prepared by reactive dc...
Electrochromic (EC) properties of sputtered Ni oxide films have been examined in 1M KCl + H2SO4 acid...
Thin films of Ni oxide, which is a promising anodic electrochromic material, were deposited by react...
Nickel oxyhydroxide (NiOOH) thin films were prepared by reactive sputtering using H2O as a reactive ...
Thin films of Ni oxide, which is a promising anodic electrochromic material, were deposited by react...
A half cell of an electrochromic (EC) device has been used to determine theelectrochromic response o...
ve be ations rge ca hydro hese olytes 118 A eceive ous solutions for use as the ion-conducting laye...
The effect of sputtering power (=60 W–180 W) on the electrochromic properties of nickel oxide films ...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Films of electrochromic Ni oxide, with thickness in the ∼100–1000-nm range, were prepared by reactiv...
Electrochromic properties of sputter-deposited nickel-based oxide films have been studied with a two...
Porous Ni oxide thin films were deposited on unheated ITO/glass substrates by sputtering in argon-ox...
Nickel oxide thin films, known as optically active counter electrodes in electrochromic devices, wer...
Electrochromic (EC) films of nickel oxide, with and without vanadium, were prepared by reactive dc...