Control of work function of indium tin oxide: A surface treatment by atmospheric-pressure plasma layer on fabric-type electrodes

The surface electronic properties of metal oxides, which affect the performances of layered electronic devices, are controlled by non-thermal atmospheric-pressure plasmas generated using a fabric-type electrode and gas flow induced through this plasma layer. We specify a method to control the work function of indium tin oxide (ITO) films by this plasma, in which such reactive species as oxidant radicals are generated. These oxidants are spatially transported in the gas flow to the ITO surface and increase the ITO's work function, as verified in our experimental results. To examine the effects of the increased work function in a specific electronic device, we treat the surface of an ITO electrode in an organic light-emitting diode and observe the enhancement of the light-emitting efficiency