We fabricated electron-only tris (8-hydroxyquinoline) aluminum (Alq_3) single-layer devices with a device structure of glass substrate/MgAg anode (100 nm)/Alq_3 layer (100 nm)/metal cathode (100 nm), and systematically varied the work functions (WF) of the metal cathodes from WF = - 1.9 (Cs) to - 2.9 (Ca), - 3.8 (Mg), − 4.4 (Al), − 4.6 (Ag), and − 5.2 eV (Au) to investigate how electron injection barriers at the cathode/Alq_3 interfaces influence their current density–voltage (J–V) characteristics. We found that current densities at a certain driving voltage decrease and the temperature dependence of J–V characteristics of the devices gradually becomes weaker as the work functions of the metal cathodes are decreased. The device with the hig...
Metal-insulator-metal tunnel junctions are common throughout the microelectronics industry. The indu...
Electron injection behavior of lithium quinolate (Liq)/Ca/Al cathode was investigated by using X-ray...
Thomas A, Brückl H, Sacher M, Schmalhorst J-M, Reiss G. Aluminum oxidation by a remote electron cycl...
We measured the energy distributions and concentrations of electron traps in O_2-unexposed and O_2-e...
The electron mobilities of tris(8-hydroxy-quinolinato) aluminum (Alq(3)) thin films at various thick...
We report the effect of a thin (about 10 Å) MgF2 layer at the cathodic interface on the quantum effi...
Ultraviolet photoelectron spectroscopy was used to demonstrate organic metal contact charge injectio...
Capacitance spectra of thin (<200 nm) Alq3 electron-only devices have been measured as a function...
Abstract : The development of metallic single electron transistor (SET) depends on the downscaling a...
Electron tunneling through high-quality, atomically thin dielectric films can provide a critical ena...
Thin film structures involving Aluminum as the base electrode, Aluminum Nitride as the insulating la...
This is the publisher’s final pdf. The published article is copyrighted by the American Institute of...
The electronic structures at the interface of aluminum tris(8-hydroxyquinoline) (Alq3)/Al2O3/Al have...
Remote plasma atomic layer deposited (RPALD) Al2O3 films were investigated to apply as tunnel and bl...
Inverted organic light-emitting diodes (inverted OLEDs) require electron injection to an organic sem...
Metal-insulator-metal tunnel junctions are common throughout the microelectronics industry. The indu...
Electron injection behavior of lithium quinolate (Liq)/Ca/Al cathode was investigated by using X-ray...
Thomas A, Brückl H, Sacher M, Schmalhorst J-M, Reiss G. Aluminum oxidation by a remote electron cycl...
We measured the energy distributions and concentrations of electron traps in O_2-unexposed and O_2-e...
The electron mobilities of tris(8-hydroxy-quinolinato) aluminum (Alq(3)) thin films at various thick...
We report the effect of a thin (about 10 Å) MgF2 layer at the cathodic interface on the quantum effi...
Ultraviolet photoelectron spectroscopy was used to demonstrate organic metal contact charge injectio...
Capacitance spectra of thin (<200 nm) Alq3 electron-only devices have been measured as a function...
Abstract : The development of metallic single electron transistor (SET) depends on the downscaling a...
Electron tunneling through high-quality, atomically thin dielectric films can provide a critical ena...
Thin film structures involving Aluminum as the base electrode, Aluminum Nitride as the insulating la...
This is the publisher’s final pdf. The published article is copyrighted by the American Institute of...
The electronic structures at the interface of aluminum tris(8-hydroxyquinoline) (Alq3)/Al2O3/Al have...
Remote plasma atomic layer deposited (RPALD) Al2O3 films were investigated to apply as tunnel and bl...
Inverted organic light-emitting diodes (inverted OLEDs) require electron injection to an organic sem...
Metal-insulator-metal tunnel junctions are common throughout the microelectronics industry. The indu...
Electron injection behavior of lithium quinolate (Liq)/Ca/Al cathode was investigated by using X-ray...
Thomas A, Brückl H, Sacher M, Schmalhorst J-M, Reiss G. Aluminum oxidation by a remote electron cycl...